Low voltage/low power sub 50 nm double gate SOI ratioed logic

被引:0
作者
Mitra, S [1 ]
Salman, A [1 ]
Ioannou, DP [1 ]
Tretz, C [1 ]
Ioannou, DE [1 ]
机构
[1] George Mason Univ, ECE Dept, Fairfax, VA 22030 USA
来源
2003 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS | 2003年
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D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:177 / 178
页数:2
相关论文
共 3 条
  • [1] Double-gate CMOS: Symmetrical-versus asymmetrical-gate devices
    Kim, K
    Fossum, JG
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (02) : 294 - 299
  • [2] Mitra S, 2002, 2002 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS, P66, DOI 10.1109/SOI.2002.1044419
  • [3] Two gates are better than one - A planar self-aligned double-gate MOSFET technology to achieve the best on/off switching ratios as gate lengths shrink
    Solomon, PM
    Guarini, KW
    Zhang, Y
    Chan, KK
    Jones, EC
    Cohen, GM
    Krasnoperova, A
    Ronay, M
    Dokumaci, O
    Hovel, HJ
    Bucchignano, JJ
    Cabral, C
    Lavoie, C
    Ku, V
    Boyd, DC
    Petrarca, KS
    Yoon, JH
    Babich, IV
    Treichler, J
    Kozlowski, PM
    Newbury, JS
    D'Emic, CP
    Sicina, RM
    Benedict, J
    Wong, HSP
    [J]. IEEE CIRCUITS & DEVICES, 2003, 19 (01): : 48 - 62