Characterization and degradation of the poly(methylphenylsiloxane)-poly(methyl methacrylate) craft copolymer

被引：0

作者：

Chang, TC ^{[1
]}

Liao, CL

Wu, KH

Wang, GP

Chiu, YS

机构：

[1] Chung Cheng Inst Technol, Dept Appl Chem, Taoyuan 33509, Taiwan

[2] Chung Shan Inst Sci & Technol, Chem Syst Res Div, Taoyuan 32526, Taiwan

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1998年 / 36卷 / 14期

关键词：

poly(methylphenylsiloxane); poly(methyl methacrylate); graft copolymer; spin-spin relaxation; degradation;

D O I：

10.1002/(SICI)1099-0518(199810)36:14<2521::AID-POLA11>3.0.CO;2-K

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Poly(methylphenylsiloxane)-poly(methyl methacrylate) graft copolymers (PSXE-g-PMMA) were prepared by condensation reaction of poly(methylphenylsiloxane)-containing epoxy resin (PSXE) with carboxyl-terminated poly(methyl methacrylate) (PMMA), and they were characterized by gel permeation chromatography (GPC), infrared (IR), and Si-29 and C-13 nuclear magnetic resonance (NMR). The microstructure of the PSXE-g-PMMA graft copolymer was investigated by proton spin-spin relaxation T-2 measurements. The thermal stability and apparent activation energy for thermal degradation of these copolymers were studied by thermogravimetry and compared with unmodified PMMA. The incorporation of poly(methylphenylsiloxane) segments in graft copolymers improved thermal stability of PMMA and enhanced the activation energy for thermal degradation of PMMA. (C) 1998 John Wiley & Sons, Inc.

引用

页码：2521 / 2530

页数：10

共 33 条

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