Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition

被引：9

作者：

Izuha, K ^{[1
]}

Asano, M ^{[1
]}

Fujisawa, T ^{[1
]}

Inoue, S ^{[1
]}

机构：

[1] Toshiba Co Ltd, Semicond Co, Proc & Mfg Engn Ctr, Isogo Ku, Yokohama, Kanagawa 2358522, Japan

来源：

OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3 | 2003年 / 5040卷

关键词：

focus; effective; in-situ; monitor; phase shift;

D O I：

10.1117/12.485364

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A focus monitor technology for attenuated PSM under annular illumination has been developed as an in-line quality control. The focus monitor pattern on a reticle employs a pair of grouped lozenge-shaped opening patterns in attenuated phase shifting region. Since the phase shifting angles of the light passing through the first and second opening patterns are 90 degrees and 180 degrees, respectively, the best focus position for the first pattern shifts to that for the second pattern. The subtraction of the length of the patterns is a linear function of the actual focal position printed on the wafer. Therefore, the effective focal position can be extracted by measuring the subtraction of the measured length. A high resolution of 10-nm defocus could be achieved by this technique.

引用

页码：590 / 599

页数：10