Fabrication and Characterization of Silicon Microchannel Plates as Temperature-Sensing Materials

被引:1
作者
Ci, Pengliang [1 ,2 ]
Shi, Jing [1 ,2 ]
Wang, Fei [1 ,2 ]
Xu, Shaohui [1 ,2 ]
Yang, Zhenya [1 ,2 ]
Yang, Pingxiong [1 ,2 ]
Wang, Lianwei [1 ,2 ]
Chu, Paul K. [3 ]
机构
[1] E China Normal Univ, Minist Educ, Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
[2] E China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China
[3] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
关键词
Silicon microchannel plate; electrochemical etching; temperature sensor; Seebeck effect; EFFICIENT THERMOELECTRIC-MATERIAL; THERMAL-CONDUCTIVITY; INFRARED-SENSORS; CMOS TECHNOLOGY; THERMOPILE; FILMS;
D O I
10.1007/s11664-011-1758-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon microchannel plates (Si MCPs) are prepared by photo-assisted electrochemical etching (PAECE), and their temperature-sensing behavior based on the Seebeck effect is studied. In particular, the dependence of the temperature sensitivity on the orientation and pore size of the Si MCPs is determined in detail. Our results clarify the relationship between the temperature sensitivity and orientation of the Si MCPs. When the angle between the measured orientation and edge of the square micropore is 45 degrees, the samples with pore dimensions of 5 mu m x 5 lm and 3 mu m x 3 mu m show temperature sensitivities of 1.88 mV/degrees C and 0.93 mV/degrees C, respectively. In general, the sample with pore size of 5 mu m x 5 mu m exhibits higher sensitivity. Si MCPs which are compatible with integrated circuit (IC) processing have promising applications in integrated microtemperature sensing.
引用
收藏
页码:2363 / 2367
页数:5
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