Filamentary Structure of Current Sheath in Miniature Plasma Focus

被引：7

作者：

Hassan, S. M. ^{[1
,2
,3
]}

Clark, E. L. ^{[1
,2
]}

Petridis, C. ^{[1
,2
]}

Androulakis, G. C. ^{[1
,2
]}

Chatzakis, J. ^{[1
,2
]}

Lee, P. ^{[4
]}

Papadogiannis, N. A. ^{[1
,2
]}

Tatarakis, M. ^{[1
,2
]}

机构：

[1] Technol Educ Inst Crete, Ctr Plasma Phys & Lasers, Khania 73133, Greece

[2] Technol Educ Inst Crete, Ctr Plasma Phys & Lasers, Rethimnon 74100, Greece

[3] Purdue Univ, W Lafayette, IN 47907 USA

[4] Nanyang Technol Univ, Natl Inst Educ, Singapore 637616, Singapore

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2011年 / 39卷 / 11期

关键词：

Gas discharge devices; pinch imaging; plasma sources; plasma sheaths;

D O I：

10.1109/TPS.2011.2159402

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Current sheath dynamics is an important parameter for good focusing or pinching in a dense plasma focus device. In this paper, we present pinching evidence and details of the filamentary structure of the current sheath in a miniature plasma focus device using a time-resolved laser shadowgraphic technique and time-integrated optical imaging.

引用

页码：2432 / 2433

页数：2

共 3 条

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Soto, L .

PLASMA PHYSICS AND CONTROLLED FUSION, 2005, 47 :A361-A381

[3] Extreme ultraviolet light sources for use in semiconductor lithography - state of the art and future development [J].

Stamm, U .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (23) :3244-3253

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