Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

被引：18

作者：

Hirano, Takashi ^{[1
]}

Osaka, Taito ^{[1
]}

Sano, Yasuhisa ^{[1
]}

Inubushi, Yuichi ^{[2
]}

Matsuyama, Satoshi ^{[1
]}

Tono, Kensuke ^{[2
,3
]}

Ishikawa, Tetsuya ^{[3
]}

Yabashi, Makina ^{[3
]}

Yamauchi, Kazuto ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, 2-1 Yamada Oka, Suita, Osaka 5650871, Japan

[2] Japan Synchrotron Radiat Res Inst JASRI, 1-1-1 Kouto, Sayo, Hyogo 6795198, Japan

[3] RIKEN SPring 8 Ctr, 1-1-1 Kouto, Sayo, Hyogo 6795148, Japan

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2016年 / 87卷 / 06期

关键词：

FREE-ELECTRON LASERS; BRAGG BEAM SPLITTER; REFLECTION; REGION;

D O I：

10.1063/1.4954731

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 mu m, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination. Published by AIP Publishing.

引用

页数：5

共 21 条

[1] TAILLESS X-RAY SINGLE-CRYSTAL REFLECTION CURVES OBTAINED BY MULTIPLE REFLECTION - (SI GE CRYSTALS - E/T) [J].

BONSE, U ;

HART, M .

APPLIED PHYSICS LETTERS, 1965, 7 (09) :238-&

[2] Non-monotonic roughening at early stages of isotropic silicon etching [J].

Dhillon, Prabhjeet Kaur ;

Sarkar, Subhendu .

APPLIED SURFACE SCIENCE, 2013, 284 :569-574

[3] NEW METHOD FOR TIME-DEPENDENT X-RAY ABSORPTION STUDIES [J].

FRAHM, R .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (07) :2515-2518

[4] Surface hardening and self-organized fractality through etching of random solids [J].

Gabrielli, A ;

Baldassarri, A ;

Sapoval, B .

PHYSICAL REVIEW E, 2000, 62 (03) :3103-3115

[5] BRAGG REFLECTION X-RAY OPTICS [J].

HART, M .

REPORTS ON PROGRESS IN PHYSICS, 1971, 34 (05) :435-&

[6] Diffractive-refractive optics: (+,-,-,+) X-ray crystal monochromator with harmonics separation [J].

Hrdy, Jaromir ;

Mikulik, Petr ;

Oberta, Peter .

JOURNAL OF SYNCHROTRON RADIATION, 2011, 18 :299-301

[7] Search for photon-photon elastic scattering in the X-ray region [J].

Inada, T. ;

Yamaji, T. ;

Adachi, S. ;

Namba, T. ;

Asai, S. ;

Kobayashi, T. ;

Tamasaku, K. ;

Tanaka, Y. ;

Inubushi, Y. ;

Sawada, K. ;

Yabashi, M. ;

Ishikawa, T. .

PHYSICS LETTERS B, 2014, 732 :356-359

[8] A compact X-ray free-electron laser emitting in the sub-angstrom region [J].

Ishikawa, Tetsuya ;

Aoyagi, Hideki ;

Asaka, Takao ;

Asano, Yoshihiro ;

Azumi, Noriyoshi ;

Bizen, Teruhiko ;

Ego, Hiroyasu ;

Fukami, Kenji ;

Fukui, Toru ;

Furukawa, Yukito ;

Goto, Shunji ;

Hanaki, Hirofumi ;

Hara, Toru ;

Hasegawa, Teruaki ;

Hatsui, Takaki ;

Higashiya, Atsushi ;

Hirono, Toko ;

Hosoda, Naoyasu ;

Ishii, Miho ;

Inagaki, Takahiro ;

Inubushi, Yuichi ;

Itoga, Toshiro ;

Joti, Yasumasa ;

Kago, Masahiro ;

Kameshima, Takashi ;

Kimura, Hiroaki ;

Kirihara, Yoichi ;

Kiyomichi, Akio ;

Kobayashi, Toshiaki ;

Kondo, Chikara ;

Kudo, Togo ;

Maesaka, Hirokazu ;

Marechal, Xavier M. ;

Masuda, Takemasa ;

Matsubara, Shinichi ;

Matsumoto, Takahiro ;

Matsushita, Tomohiro ;

Matsui, Sakuo ;

Nagasono, Mitsuru ;

Nariyama, Nobuteru ;

Ohashi, Haruhiko ;

Ohata, Toru ;

Ohshima, Takashi ;

Ono, Shun ;

Otake, Yuji ;

Saji, Choji ;

Sakurai, Tatsuyuki ;

Sato, Takahiro ;

Sawada, Kei ;

Seike, Takamitsu .

NATURE PHOTONICS, 2012, 6 (08) :540-544

[9] The best of both worlds: automated CMP polishing of channel- cut monochromators [J].

Kasman, Elina ;

Erdmann, Mark ;

Stoupin, Stanislav .

ADVANCES IN LABORATORY-BASED X-RAY SOURCES, OPTICS, AND APPLICATIONS IV, 2015, 9590

[10] Potential use of V-channel Ge(220) monochromators in X-ray metrology and imaging [J].

Korytar, D. ;

Vagovic, P. ;

Vegsoe, K. ;

Siffalovic, P. ;

Dobrocka, E. ;

Jark, W. ;

Ac, V. ;

Zaprazny, Z. ;

Ferrari, C. ;

Cecilia, A. ;

Hamann, E. ;

Mikulik, P. ;

Baumbach, T. ;

Fiederle, M. ;

Jergel, M. .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 2013, 46 :945-952

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