Optically tunable arrayed structures for highly sensitive plasmonic detection via simplified holographic lithography

被引：21

作者：

Jeon, Hwan Chul ^{[1
]}

Heo, Chul-Joon ^{[1
]}

Lee, Su Yeon ^{[1
]}

Park, Sung-Gyu ^{[1
]}

Yang, Seung-Man ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Natl CRI Ctr Integrated Optofluid Syst, Dept Chem & Biomol Engn, Taejon 305701, South Korea

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2012年 / 22卷 / 11期

关键词：

MULTIBEAM INTERFERENCE LITHOGRAPHY; ENHANCED RAMAN-SCATTERING; PHOTONIC CRYSTALS; FABRICATION; ELECTRODEPOSITION;

D O I：

10.1039/c2jm15723c

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Hexagonally arranged plasmonic dot arrays were fabricated using simplified holographic lithography, electron-beam evaporation and lift-off processes. In our strategy, we used face-centered cubic structures as metal deposition masks which were created by prism holographic lithography. The features of plasmonic dot arrays such as arrangements, shapes, and sizes depended on the number of face-centered cubic structure layers and the laser exposure dose. The arrays showed tunable optical properties and were useful for surface-enhanced Raman scattering.

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收藏

页码：4603 / 4606

页数：4

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