Surfactant and impurity properties of antimony on GaAs and GaAs1-xNx on GaAs [100] by solid source molecular beam epitaxy

被引:12
作者
Cheah, WK
Fan, WJ
Yoon, SF
Tan, KH
Liu, R
Wee, ATS
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[2] Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
关键词
MBE; PL; XRD; SIMS; GaAsN; surfactant;
D O I
10.1016/j.tsf.2005.04.040
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Low temperature (4.5 K) photoluminescence measurements and two-dimensional [115] high resolution X-ray diffractometry rocking curves of antimony doped III-V-N on GaAs grown by solid source molecular beam epitaxy, show a possible non-radiative recombination defect known as the Sb-Ga, heteroantisite and another Sb-related defect peak at 1017 nm (similar to 1.22 eV). The elimination of these defects can be a measure of the improvement in crystal quality of GaAsN:Sb. We find that Sb behaves as an impurity and competes with N for As sites until the surfactant effect commences at 1.733 x 10(-6) Pa. The Sb latency effect which results in a graded Sb composition at the interface was found by secondary ion mass spectroscopy measurements. (c) 2005 Elsevier B.V All rights. reserved.
引用
收藏
页码:56 / 61
页数:6
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