Reducing intrinsic loss in superconducting resonators by surface treatment and deep etching of silicon substrates

被引:157
作者
Bruno, A. [1 ]
de Lange, G.
Asaad, S.
van der Enden, K. L.
Langford, N. K.
DiCarlo, L.
机构
[1] Delft Univ Technol, QuTech Adv Res Ctr, NL-2628 CJ Delft, Netherlands
关键词
AMPLIFICATION;
D O I
10.1063/1.4919761
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present microwave-frequency NbTiN resonators on silicon, systematically achieving internal quality factors above 1M in the quantum regime. We use two techniques to reduce losses associated with two-level systems: an additional substrate surface treatment prior to NbTiN deposition to optimize the metal-substrate interface and deep reactive-ion etching of the substrate to displace the substrate-vacuum interfaces away from high electric fields. The temperature and power dependence of resonator behavior indicate that two-level systems still contribute significantly to energy dissipation, suggesting that more interface optimization could further improve performance. (C) 2015 AIP Publishing LLC.
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页数:4
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