Micromachining of organic polymers by X-ray photo-etching using a 10 Hz laser-plasma radiation source

被引：38
作者：
Bartnik, A
Fiedorowicz, H
Jarocki, R
Juha, L
Kostecki, J
Rakowski, R
Szczurek, M
机构：
[1] Mil Univ Technol, Inst Optoelect, PL-00908 Warsaw, Poland
[2] Acad Sci Czech Republ, Inst Phys, Joint Res Lab PALS, Prague 18221 8, Czech Republic
[3] Acad Sci Czech Republ, Inst Plasma Phys, Prague 18221 8, Czech Republic
来源：
MICROELECTRONIC ENGINEERING | 2005年 / 78-79卷
关键词：
microstructures; photo-etching; X-rays;
D O I：
10.1016/j.mee.2004.12.058
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The first results of experiments on direct photo-etching of organic polymers using a 10 Hz X-ray source based on a laser-irradiated gas puff target are presented. X-ray radiation in the wavelength range from 2 to 15 nm was produced as a result of irradiation of a double-stream gas puff target with Nd:YAG laser pulses of energy 0.8 J and time duration 3 ns. The resulting X-ray pulses with energy of about 100-200 mJ were used to irradiate samples of organic polymers to create microstructures by direct photo-etching. The obtained results show that direct photo-etching using the laser-plasma X-ray source could be useful for micromachining of organic polymers. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：452 / 456
页数：5
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