Self-Assembling Materials for Lithographic Patterning: Overview, Status and Moving Forward

被引：22

作者：

Hinsberg, William ^{[1
]}

Cheng, Joy ^{[1
]}

Kim, Cheol ^{[1
]}

Sanders, Daniel P. ^{[1
]}

机构：

[1] IBM Almaden Res Ctr, San Jose, CA 95120 USA

来源：

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES II | 2010年 / 7637卷

关键词：

self assembly; directed self assembly; block copolymers; COPOLYMER FILMS; POLYMERS;

D O I：

10.1117/12.852230

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We survey several different approaches wherein self-assembly has been applied in lithographic patterning. As part of this survey, we trace the evolution of block copolymer directed self-assembly used as lithographic technique, and summarize its current status. We compare a process based on block copolymer lithography with an equivalent process based on spacer pitch division. We conclude with a brief discussion of design issues and future research in the field.

引用

页数：11

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