An introduction to deep submicron CMOS for vertex applications

被引:20
|
作者
Campbell, M [1 ]
Anelli, G [1 ]
Cantatore, E [1 ]
Faccio, F [1 ]
Heijne, EHM [1 ]
Jarron, P [1 ]
Santiard, JC [1 ]
Snoeys, W [1 ]
Wyllie, K [1 ]
机构
[1] CERN, Div EP, CH-1211 Geneva 23, Switzerland
关键词
CMOS; readout electronics; vertex detectors;
D O I
10.1016/S0168-9002(01)01135-4
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Microelectronics has become a key enabling technology in the development of tracking detectors for High Energy Physics. Deep submicron CMOS is likely to be extensively used in all future tracking systems. Radiation tolerance in the Mrad region has been achieved and complete readout chips comprising many millions of transistors now exist. The choice of technology is dictated by market forces but the adoption of deep submicron CMOS for tracking applications still poses some challenges. The techniques used are reviewed and some of the future challenges are discussed. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:140 / 145
页数:6
相关论文
共 50 条
  • [31] Fault clustering in deep-submicron CMOS processes
    Schat, Jan
    2008 DESIGN, AUTOMATION AND TEST IN EUROPE, VOLS 1-3, 2008, : 1360 - 1363
  • [32] Gate engineering for deep-submicron CMOS transistors
    Yu, B
    Ju, DH
    Lee, WC
    Kepler, N
    King, TJ
    Hu, CM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (06) : 1253 - 1262
  • [33] Leakage current in deep-submicron CMOS circuits
    Roy, K
    Mukhopadhyay, S
    Mahmoodi-Meimand, H
    JOURNAL OF CIRCUITS SYSTEMS AND COMPUTERS, 2002, 11 (06) : 575 - 600
  • [34] Identifying defects in deep-submicron CMOS ICs
    Soden, JM
    Hawkins, CF
    Miller, AC
    IEEE SPECTRUM, 1996, 33 (09) : 66 - 71
  • [35] Analog design in deep submicron CMOS processes for LHC
    Rivetti, A
    Anelli, G
    Anghinolfi, F
    Campbell, M
    Delmastro, M
    Heijne, E
    Faccio, F
    Florian, S
    Jarron, P
    Kloukinas, K
    Marchioro, A
    PROCEEDINGS OF THE FIFTH WORKSHOP ON ELECTRONICS FOR LHC EXPERIMENTS, 1999, : 157 - 161
  • [36] RF integration into CMOS and deep-submicron challenges
    Svensson, C
    Soumyanath, K
    Kaiser, B
    Vasudev, PK
    Carley, LR
    Kalter, H
    Ackland, B
    IEEE DESIGN & TEST OF COMPUTERS, 1999, 16 (03): : 112 - 116
  • [37] Mismatch characterization and modelization of Deep Submicron CMOS Transistors
    Thibieroz, H
    Duvallet, A
    MICROELECTRONIC DEVICE TECHNOLOGY III, 1999, 3881 : 121 - 128
  • [38] Integration of NiSi SALICIDE for deep submicron CMOS technologies
    Lin, XW
    Ibrahim, N
    Topete, L
    Pramanik, D
    ADVANCED INTERCONNECTS AND CONTACT MATERIALS AND PROCESSES FOR FUTURE INTEGRATED CIRCUITS, 1998, 514 : 179 - 184
  • [39] Energy efficient signaling in deep submicron CMOS technology
    Ben Dhaou, I
    Sundararajan, V
    Tenhunen, H
    Parhi, KK
    INTERNATIONAL SYMPOSIUM ON QUALITY ELECTRONIC DESIGN, PROCEEDINGS, 2001, : 319 - 324
  • [40] MONOLITHIC SENSORS IN DEEP SUBMICRON CMOS TECHNOLOGY FOR LOW MATERIAL BUDGET, HIGH RATE HEP APPLICATIONS
    Andreoli, C.
    Ratti, L.
    Manghisoni, M.
    Traversi, G.
    ASTROPARTICLE, PARTICLE AND SPACE PHYSICS, DETECTORS AND MEDICAL PHYSICS APPLICATIONS, 2008, 4 : 18 - +