Extraordinary optical gain from silicon implanted with erbium

被引:23
作者
Lourenco, M. A. [1 ]
Gwilliam, R. M.
Homewood, K. P.
机构
[1] Univ Surrey, Fac Engn & Phys Sci, Adv Technol Inst, Surrey GU2 7XH, England
[2] Si Light Technol Ltd, Unit 47, Surrey Technol Ctr, Surrey GU2 7YG, England
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1063/1.2797975
中图分类号
O59 [应用物理学];
学科分类号
摘要
Here we report on measurements of optical gain at 1.5 mu m in crystalline silicon. Gain is achieved by the incorporation of the rare earth erbium in silicon. A method was developed to enable the gain measurement in short silicon waveguides. Crucially, gain values obtained are significantly greater than previously supposed. We have measured a lower limit for the optical cross section for Er3+ of 5x10(-19) cm(2), 30 times higher than previously anticipated. Given these higher values, this system now offers a realistic route to the production of electrically pumped silicon optical amplifier and laser devices using standard silicon process technology. (C) 2007 American Institute of Physics.
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页数:3
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