Localized Heating and Switching in MoTe2-Based Resistive Memory Devices

被引:43
作者
Datye, Isha M. [1 ]
Rojo, Miguel Munoz [1 ]
Yalon, Eilam [1 ]
Deshmukh, Sanchit [1 ]
Mleczko, Michal J. [1 ]
Pop, Eric [2 ,3 ]
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Elect Engn, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[3] Stanford Univ, Precourt Inst Energy, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
MoTe2; 2D materials; resistive memory; bipolar switching; scanning thermal microscopy; localized heating; METAL; DIFFUSION; DEFECTS; MOTE2; FILMS;
D O I
10.1021/acs.nanolett.9b05272
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Two-dimensional (2D) materials have recently been incorporated into resistive memory devices because of their atomically thin nature, but their switching mechanism is not yet well understood. Here we study bipolar switching in MoTe2-based resistive memory of varying thickness and electrode area. Using scanning thermal microscopy (SThM), we map the surface temperature of the devices under bias, revealing clear evidence of localized heating at conductive "plugs" formed during switching. The SThM measurements are correlated to electro-thermal simulations, yielding a range of plug diameters (250 to 350 nm) and temperatures at constant bias and during switching. Transmission electron microscopy images reveal these plugs result from atomic migration between electrodes, which is a thermally-activated process. However, the initial forming may be caused by defect generation or Te migration within the MoTe2. This study provides the first thermal and localized switching insights into the operation of such resistive memory and demonstrates a thermal microscopy technique that can be applied to a wide variety of traditional and emerging memory devices.
引用
收藏
页码:1461 / 1467
页数:7
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