PLD thin films obtained from CrO3 and Cr8O21 targets

被引:21
作者
Guinneton, F
Monnereau, O
Argeme, L
Stanoi, D
Socol, G
Mihailescu, IN
Zhang, T
Grigorescu, C
Trodahl, HJ
Tortet, L
机构
[1] Univ Aix Marseille 1, Ctr St Jerome, UMR 6121, Lab MADIREL, F-13397 Marseille, France
[2] Natl Inst Laser Plasma & Radiat Phys, Laser Dept, RO-77125 Bucharest, Romania
[3] Univ London Imperial Coll Sci Technol & Med, Expt Solid State Grp, Blackett Lab, London SW7 2BZ, England
[4] Natl Inst Res & Dev Optoelect, RO-77125 Bucharest, Romania
[5] Victoria Univ Wellington, Sch Chem & Phys Sci, Wellington, New Zealand
关键词
chromium oxides; PLD; thin films; XRD; SEM; AFM; Raman spectroscopy;
D O I
10.1016/j.apsusc.2005.01.073
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin films of chromium oxides mixtures have been grown on sapphire substrates using pulsed laser deposition (PLD). The work originates from the goal of enhancing the CrO2 concentration in the films deposited from targets made of various chromium oxides. Their stability depends on temperature and pressure conditions. The PLD experiments are reviewed with the aim of discussing the influence of the target composition and of the deposition conditions upon the resulted films. The targets and corresponding thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and Raman spectroscopy. The Cr8O21 targets are the most stable, which allows the preparation of thin films with a reproducible CrO2 content of about 25% and a satisfactory surface morphology. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:139 / 144
页数:6
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