High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor

被引:8
作者
Schaepkens, M [1 ]
Selezneva, S [1 ]
Moeleker, P [1 ]
Iacovangelo, CD [1 ]
机构
[1] Gen Elect Global Res Ctr, Schenectady, NY 12309 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2003年 / 21卷 / 04期
关键词
D O I
10.1116/1.1575220
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A unique high-rate plasma deposition process has been developed to generate abrasion resistant coatings on polymeric substrates. The process relies on the integration of a plurality of individual expanding thermal plasma sources into a multisource setup. In this work, we will discuss the effects of various hardware and process parameters on the performance of a dual-source system that has been used to apply abrasion resistant coatings to polycarbonate substrates. It will be shown that a properly engineered dual-source system can generate transparent organosilicon-based coatings that provide uniform glasslike abrasion resistance across a 30 cm width on substrates that are laterally translated past the dual-source array. (C) 2003 American Vacuum Society.
引用
收藏
页码:1266 / 1271
页数:6
相关论文
共 24 条
  • [1] CARBON DEPOSITION USING AN EXPANDING CASCADED ARC DC PLASMA
    BEULENS, JJ
    BUURON, AJM
    SCHRAM, DC
    [J]. SURFACE & COATINGS TECHNOLOGY, 1991, 47 (1-3) : 401 - 417
  • [2] BRUSSAARD S, 1999, THESIS EINDHOVEN U T
  • [3] FAST DEPOSITION OF AMORPHOUS-CARBON FILMS BY AN EXPANDING CASCADED ARC PLASMA-JET
    BUURON, AJM
    VANDESANDEN, MCM
    VANOOIJ, WJ
    DRIESSENS, RMA
    SCHRAM, DC
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (01) : 528 - 540
  • [4] Flow dynamics and invasion by background gas of a supersonically expanding thermal plasma
    Engeln, R
    Mazouffre, S
    Vankan, P
    Schram, DC
    Sadeghi, N
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (04) : 595 - 605
  • [5] Quality improvement of plasma-beam-deposited amorphous hydrogenated carbon with higher growth rate
    Gielen, JWAM
    vandeSanden, MCM
    Kleuskens, PRM
    Schram, DC
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (03) : 492 - 498
  • [6] Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate
    Gielen, JWAM
    vandeSanden, MCM
    Schram, DC
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (02) : 152 - 154
  • [7] Deposition of amorphous carbon layers from C2H2 and CF4 with an expanding thermal arc plasma beam set-up
    Gielen, JWAM
    vandeSanden, MCM
    Schram, DC
    [J]. THIN SOLID FILMS, 1995, 271 (1-2) : 56 - 63
  • [8] Optical and mechanical properties of plasma-beam-deposited amorphous hydrogenated carbon
    Gielen, JWAM
    Kleuskens, PRM
    vandeSanden, MCM
    vanIjzendoorn, LJ
    Schram, DC
    Dekempeneer, EHA
    Meneve, J
    [J]. JOURNAL OF APPLIED PHYSICS, 1996, 80 (10) : 5986 - 5995
  • [9] Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma
    Kessels, WMM
    van de Sanden, MCM
    Severens, RJ
    Schram, DC
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (07) : 3313 - 3320
  • [10] Hydrogen poor cationic silicon clusters in an expanding argon-hydrogen-silane plasma
    Kessels, WMM
    van de Sanden, MCM
    Schram, DC
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (19) : 2397 - 2399