High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor
被引:8
作者:
Schaepkens, M
论文数: 0引用数: 0
h-index: 0
机构:
Gen Elect Global Res Ctr, Schenectady, NY 12309 USAGen Elect Global Res Ctr, Schenectady, NY 12309 USA
Schaepkens, M
[1
]
Selezneva, S
论文数: 0引用数: 0
h-index: 0
机构:
Gen Elect Global Res Ctr, Schenectady, NY 12309 USAGen Elect Global Res Ctr, Schenectady, NY 12309 USA
Selezneva, S
[1
]
Moeleker, P
论文数: 0引用数: 0
h-index: 0
机构:
Gen Elect Global Res Ctr, Schenectady, NY 12309 USAGen Elect Global Res Ctr, Schenectady, NY 12309 USA
Moeleker, P
[1
]
Iacovangelo, CD
论文数: 0引用数: 0
h-index: 0
机构:
Gen Elect Global Res Ctr, Schenectady, NY 12309 USAGen Elect Global Res Ctr, Schenectady, NY 12309 USA
Iacovangelo, CD
[1
]
机构:
[1] Gen Elect Global Res Ctr, Schenectady, NY 12309 USA
来源:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
|
2003年
/
21卷
/
04期
关键词:
D O I:
10.1116/1.1575220
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
A unique high-rate plasma deposition process has been developed to generate abrasion resistant coatings on polymeric substrates. The process relies on the integration of a plurality of individual expanding thermal plasma sources into a multisource setup. In this work, we will discuss the effects of various hardware and process parameters on the performance of a dual-source system that has been used to apply abrasion resistant coatings to polycarbonate substrates. It will be shown that a properly engineered dual-source system can generate transparent organosilicon-based coatings that provide uniform glasslike abrasion resistance across a 30 cm width on substrates that are laterally translated past the dual-source array. (C) 2003 American Vacuum Society.