Amorphous oxygen-containing hydrogenated carbon films formed by plasma enhanced chemical vapor deposition

被引：38
作者：
Durrant, SF
Castro, SG
Cisneros, JI
daCruz, NC
deMoraes, MAB
机构：
[1] UNIV ESTADUAL CAMPINAS,INST FIS GLEB WATAGHIN,GRP FIS SUPERFICIES,BR-13083970 CAMPINAS,SP,BRAZIL
[2] UNIV ESTADUAL CAMPINAS,INST FIS GLEB WATAGHIN,GRP CONVERSAO FOTOVOLTAICA,BR-13083970 CAMPINAS,SP,BRAZIL
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 01期
关键词：
D O I：
10.1116/1.579906
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Films were deposited from glow discharge plasmas of acetylene-oxygen-argon mixtures in a deposition system fed with radio frequency power. The principal variable was the proportion of oxygen in the gas feed, X(ox). The chemical structure and elemental composition of the films were investigated by transmission infrared spectrophotometry and x-ray photoelectron spectroscopy. Optical properties-refractive index, absorption coefficient, and optical gap-were determined from transmission ultraviolet-visible spectroscopy data. The latter also allowed the determination of film thicknesses and hence deposition rates. It was found that the oxygen content of the films and, within limits, the refractive index are controllable by the selection of X(ox). (C) 1996 American Vacuum Society.
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页码：118 / 124
页数：7
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