Kinetics of the SiH3+H2O2 and SiH3+O2 reactions

被引：4

作者：

Meyer, JP ^{[1
]}

Hershberger, JF ^{[1
]}

机构：

[1] N Dakota State Univ, Dept Chem, Fargo, ND 58105 USA

来源：

JOURNAL OF PHYSICAL CHEMISTRY A | 2003年 / 107卷 / 31期

关键词：

D O I：

10.1021/jp022262o

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The kinetics of the reaction of silyl radicals (SiH3) with H2O2 and O-2 were studied using time-resolved infrared diode laser absorption spectroscopy. The rate constant SiH3 + H2O2 at 298 K was determined to be 9.8 x 10(-12) cm(3) molecule(-1) s(-1). This rate constant is independent of temperature over the range 298-573 K. The yield of OH products was quantified by reaction with CO to produce CO2, which was detected by infrared spectroscopy. The branching ratio of the SiH3 + H2O2 reaction into OH product channels was estimated to be <0.05 at 298 K. Similar experiments on the SiH3 + O-2 reaction indicated an OH product branching ratio of 0.076 +/- 0.04 at 298 K.

引用

页码：5963 / 5967

页数：5

共 31 条

[1]

[Anonymous], SEMICONDUCTORS SEMIM

[2] ABSOLUTE RATE CONSTANTS FOR REACTIONS OF O(P-3) ATOMS AND OH RADICALS WITH SIH4 OVER TEMPERATURE-RANGE OF 297-438-DEGREES-K [J].