Determination of the active-to-passive transition in the oxidation of silicon carbide in standard and microwave-excited air

被引:146
作者
Balat, MJH
机构
[1] Inst. Sci. Genie Mat. et Procedes, 66125 Font-Romeu, Odeillo
关键词
D O I
10.1016/0955-2219(95)00104-2
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The active-to-passive transition is determined on sintered silcon carbide for two atmospheres: standard air and air excited by micrwaves, as a function of oxygen partial pressure and temperature. The experiments were done at low total pressure ranging from 10(3) to 25 x 10(3) Pa and at high temperature from 1385 to 1765 degrees C at a constant air flow rate. The results are compared with literature data and we try to explain why they are so many differences between all the experimental and theoretical results.
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页码:55 / 62
页数:8
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