Error analyses on some typically approximate solutions of residual stress within a thin film on a substrate

被引:25
|
作者
Zhang, XC [2 ]
Xu, BS
Wang, HD
Wu, YX
机构
[1] Natl Key Lab Remfg, Beijing 100072, Peoples R China
[2] Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2039277
中图分类号
O59 [应用物理学];
学科分类号
摘要
Stoney's equation and subsequent modifications and some approximations are widely used to evaluate the macrostress within a film on a substrate, though some of these solutions are only applicable for thin films. The purpose of this paper is to review the considerable efforts devoted to the analysis of residual stresses in a single-layer film in the last century and recent years and to estimate the errors involved in using these formulas. The following are some of the important results that can be obtained. (1) The exact solution for the residual stress can be expressed in terms of Stoney's equation [Proc. R. Soc. London A82, 172 (1909)] and a correction factor, (1+Sigma eta(3))/(1+eta), where Sigma,eta are the ratios of the elastic modulus and the thickness of the film to those of the substrate, respectively. (2) When the thickness ratio of the film and the substrate is less than 0.1, Stoney's equation and Roll's approximation [J. Appl. Phys. 47, 3224 (1976)] do not cause serious errors. (3) The approximation proposed by Vilms and Kerps [J. Appl. Phys. 53, 1536 (1982)] is an improved modification for Stoney's equation and can be applicable when eta <= 0.3. (4) The approximations proposed by Brenner and Senderoff [J. Res. Natl. Bur. Stand. 42, 105 (1949)] and Teixeira [Thin Solid Films 392, 276 (2001)] can lead to serious errors and should be avoided. (5) The approximation based on the assumption of constant elastic modulus is only applicable for a ratio of eta <= 0.01 and can be very misleading. (c) 2005 American Institute of Physics.
引用
收藏
页数:5
相关论文
共 50 条
  • [1] Error analyses on some typically approximate solutions of residual stress within a thin film on a substrate (vol 98, pg 053516, 2005)
    Zhang, XC
    Xu, BS
    Wang, HD
    Wu, YX
    JOURNAL OF APPLIED PHYSICS, 2006, 99 (05)
  • [2] Residual stress measurement of porous silicon thin film by substrate curvature method
    Di Yuxian
    Ji Xinhua
    Hu Ming
    Qin Yuwen
    Chen Jinlong
    Experimental Mechanics in Nano and Biotechnology, Pts 1 and 2, 2006, 326-328 : 223 - 226
  • [3] Residual stress measurement of porous silicon thin film by substrate curvature method
    Di Yu-Xian
    Ji Xin-Hua
    Hu Ming
    Qin Yu-Wen
    Chen Jin-Long
    ACTA PHYSICA SINICA, 2006, 55 (10) : 5451 - 5454
  • [4] A Theoretical Analysis for Arbitrary Residual Stress of Thin Film/Substrate System With Nonnegligible Film Thickness
    Sun, Kunjie
    Sun, Chen
    Chen, Jubing
    JOURNAL OF APPLIED MECHANICS-TRANSACTIONS OF THE ASME, 2024, 91 (05):
  • [5] ORIGIN OF RESIDUAL-STRESS IN A TEXTURED AU THIN-FILM ON A LIF SUBSTRATE
    DURAND, N
    BADAWI, KF
    DECLEMY, A
    GOUDEAU, P
    APPLIED SURFACE SCIENCE, 1994, 81 (02) : 119 - 126
  • [6] Residual stress properties of polysilicon thin film
    Peking Univ, Beijing, China
    Pan Tao Ti Hsueh Pao, 6 (463-467):
  • [7] Assumptions in thin film residual stress methods
    Vermeulen, AC
    ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES, 2002, 404-7 : 35 - 40
  • [8] Nondestructive measurement of the residual stress TiN thin film coated on AISI 304 substrate by X ray stress analyzer
    Zhang, YK
    Feng, AX
    Lu, JZ
    Kong, DJ
    Tang, CP
    ICO20: MATERIALS AND NANOSTRUCTURES, 2006, 6029
  • [9] Residual stress regulation for CZTSSe thin film on flexible titanium substrate by introducing a Ge transition layer
    Sun, Luanhong
    Shen, Honglie
    Huang, Hulin
    Yang, Jiale
    Li, Yanqi
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2019, 30 (08) : 7337 - 7346
  • [10] Residual Stress Analysis for Oxide Thin Film Deposition on Flexible Substrate Using Finite Element Method
    Chen, Hsi-Chao
    Huang, Chen-Yu
    Lin, Ssu-Fan
    Chen, Sheng-Hui
    ADVANCES IN OPTICAL THIN FILMS IV, 2011, 8168