Suppression of photocatalytic efficiency in highly N-doped anatase films

被引：104

作者：

Okato, T ^{[1
]}

Sakano, T ^{[1
]}

Obara, M ^{[1
]}

机构：

[1] Keio Univ, Dept Elect & Elect Engn, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan

来源：

PHYSICAL REVIEW B | 2005年 / 72卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.72.115124

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report the role of N in epitaxial films of anatase TiO2. The films were artificially grown with a two-step temperature-tuned epitaxy which utilized the high-temperature cubic phase of LaAlO3 substrates. The preparation of highly crystallized anatase with various N concentrations (C-N <= 3.85 at. %) allowed us to identify the optimum dopant concentration (C-N=1-2 at. %). At higher doping levels, N is found to be difficult to substitute for O having been predicted to contribute to the band-gap narrowing, giving rise to the undesirable deep-level defects. In addition, a study by x-ray and Raman spectroscopy revealed that the growth of anatase became more difficult, and the stable phase was shifted to rutile at the higher N concentrations.

引用

页数：6

共 29 条

[21] First-principles calculations of the phase stability of TiO2 -: art. no. 224112 [J].

Muscat, J ;

Swamy, V ;

Harrison, NM .

PHYSICAL REVIEW B, 2002, 65 (22) :2241121-22411215

[22] Deep-level optical spectroscopy investigation of N-doped TiO2 films -: art. no. 132104 [J].

Nakano, Y ;

Morikawa, T ;

Ohwaki, T ;

Taga, Y .

APPLIED PHYSICS LETTERS, 2005, 86 (13) :1-3

[23] TITANIUM NITRIDE OXIDATION CHEMISTRY - AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY [J].

SAHA, NC ;

TOMPKINS, HG .

JOURNAL OF APPLIED PHYSICS, 1992, 72 (07) :3072-3079

[24] Photocatalytic and photoelectrochemical properties of nitrogen-doped titanium dioxide [J].

Sakthivel, S ;

Kisch, H .

CHEMPHYSCHEM, 2003, 4 (05) :487-490

[25] PHOTOCATALYTIC ACTIVITY OF NOX-DOPED TIO2 IN THE VISIBLE-LIGHT REGION [J].

SATO, S .

CHEMICAL PHYSICS LETTERS, 1986, 123 (1-2) :126-128

[26] X-ray absorption and photoelectron spectroscopic study of plasma-nitrided SiO2 film -: art. no. 113711 [J].

Song, HJ ;

Shin, HJ ;

Chung, YS ;

Lee, JC ;

Lee, MK .

JOURNAL OF APPLIED PHYSICS, 2005, 97 (11)

[27] Preparation of high quality nitrogen doped TiO2 thin film as a photocatalyst using a pulsed laser deposition method [J].

Suda, Y ;

Kawasaki, H ;

Ueda, T ;

Ohshima, T .

THIN SOLID FILMS, 2004, 453 :162-166

[28] Preparation of epitaxial TiO2 films by PLD for photocatalyst applications [J].

Yamaki, T ;

Sumita, T ;

Yamamoto, S ;

Miyashita, A .

JOURNAL OF CRYSTAL GROWTH, 2002, 237 :574-579

[29] Role of particle size in nanocrystalline TiO2-based photocatalysts [J].

Zhang, ZB ;

Wang, CC ;

Zakaria, R ;

Ying, JY .

JOURNAL OF PHYSICAL CHEMISTRY B, 1998, 102 (52) :10871-10878

← 1 2 3 →