Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography

被引：12

作者：

Niwa, D ^{[1
]}

Omichi, K ^{[1
]}

Motohashi, N ^{[1
]}

Homma, T ^{[1
]}

Osaka, T ^{[1
]}

机构：

[1] Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan

来源：

CHEMISTRY LETTERS | 2004年 / 33卷 / 02期

关键词：

D O I：

10.1246/cl.2004.176

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Formation of organosilane monolayer templates using ultraviolet and electron-beam (EB) lithography was investigated. The oligonucleotides were covalently immobilized with high selectivity only to the amino-monolayer modified regions locally formed on the template surfaces at micro and nanometer scale. By using EB lithography, patterned immobilization in nanometer scale, as small as 20nm, was achieved.

引用

页码：176 / 177

页数：2

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