Laser interference lithography on non-planar surface for roll-to-roll process

被引：1

作者：

Park, Jun Han ^{[1
]}

Yun, Dan Hee ^{[2
]}

Ma, Yong Won ^{[2
]}

Gwak, Cheong Yeol ^{[2
]}

Je, Gyeongju ^{[1
]}

Shin, Bo Sung ^{[3
]}

机构：

[1] Pusan Natl Univ, Dept Cognomechatron Engn, Busan, South Korea

[2] Interdisciplinary Dept Adv Innovat Mfg Engn, Busan, South Korea

[3] Pusan Natl Univ, Dept Opt & Mechatron Engn, Busan, South Korea

来源：

LASER-BASED MICRO- AND NANOPROCESSING XII | 2018年 / 10520卷

关键词：

Laser interference lithography; seamless mold; roll-to-roll; nanopatterning; large area patterning; NANOIMPRINT LITHOGRAPHY; FABRICATION;

D O I：

10.1117/12.2288221

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

R2R (Roll-to-roll) production is a powerful process for patterning owing to its cost effectiveness and high productivity. Nanopatterned cylindrical molds for continuous fabrication of nanopatterned polymer film have been generally fabricated by various methods such as e-beam lithography, anodic oxidation, photolithography, or wrapping of nanopatterned sheets. However, these fabrication processes exhibit problems such as high economic and time costs, and creation of seam and stitch. In this paper, to overcome these problems, we suggest the cost-effective laser interference lithography (LIL) for fabrication of a nanopatterned cylindrical molds. LIL is a suitable process for fabricating high-resolution periodic nanometer patterns in large areas without the creation of seams or stitches. Periodic line patterns with hundred-nanometer periodicity were fabricated by LIL and pattern distortions were observed. Period and width of the line patterns on the cylindrical mold were measured along the circumference to experimentally confirm the distortion as related to the projection of light. Further, it was observed that the degree of distortion was dependent on the diameter of the cylindrical mold and the position along the circumference. However, it was theoretically expected that this distortion can be minimized below 0.2% by using a cylindrical mold with a sufficiently large diameter and control of the exposure area.

引用

页数：6

共 14 条

[1] Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting [J].