A comparative study of YBCO thin film growth by inverted cylindrical magnetron sputtering and inverted cylindrical sputtering

被引：2

作者：

Li, YR ^{[1
]}

Liu, XZ ^{[1
]}

Tao, BW ^{[1
]}

机构：

[1] Univ Elect Sci & Technol China, Inst Informat Mat Sci & Engn, Chengdu 610054, Peoples R China

来源：

JOURNAL OF SUPERCONDUCTIVITY | 2001年 / 14卷 / 03期

关键词：

sputtering; deposition process; superconductivity; YBCO;

D O I：

10.1023/A:1011199027407

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A comparative study of Y1Ba2Cu3O7-x (YBCO) thin film growth by inverted cylindrical magnetron sputtering and non-magnetron inverted cylindrical sputtering was clone. At the total pressure of 40 Pa epitaxial YBCO thin films with good superconducting transition properties and smooth surface were prepared by the magnetron source. Inductive measurements gave T-C0 = SM K and DeltaT(C) = 0.5 K. The full width at half maximum (FWHM) value of the rocking curve was 0.18 degrees. The average surface smoothness of the film was 250 Angstrom. With the non-magnetron source at the same total pressure. the superconducting transition properties of the YBCO thin films were not good because of intense bombardment by energetic ions. However. by raising the total pressure to 60 Pa. epitaxial YBCO thin films with good superconducting transition properties and smooth surface could be prepared by non-magnetron inverted cylindrical sputtering-T-C0 = 90.5 K DeltaT(C) = 0.5 K. The FWHM value of the rocking curve was 0.23 degrees and the average surface smoothness of the film was 900 Angstrom.

引用

页码：443 / 447

页数：5

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