Molecular engineering applications in the growth of SiC-based thin films by chemical vapor deposition

被引：0
|
作者：
Loboda, M. J. [1 ]
机构：
[1] Dow Corning Corp, Midland, MI 48686 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2009年 / 237卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
204-POLY
引用
收藏
页数：1
相关论文
共 50 条
  • [41] Thin films of molecular materials grown on silicon substrates by chemical vapor deposition and electrodeposition
    Valade, L.
    de Caro, D.
    Savy, J. -P.
    Malfant, I.
    Faulmann, C.
    Almeida, M.
    Fraxedas, J.
    Brooks, J. S.
    JOURNAL OF LOW TEMPERATURE PHYSICS, 2006, 142 (3-4) : 393 - 396
  • [42] Thin films of molecular materials grown on silicon substrates by chemical vapor deposition and electrodeposition
    L. Valade
    D. de Caro
    J. P. Savy
    I. Malfant
    C. Faulmann
    M. Almeida
    J. Fraxedas
    J. S. Brooks
    Journal of Low Temperature Physics, 2006, 142 : 393 - 396
  • [43] Thin Films of Molecular Materials Grown on Silicon Substrates by Chemical Vapor Deposition and Electrodeposition
    L. Valade
    D. de Caro
    J. -P. Savy
    I. Malfant
    C. Faulmann
    M. Almeida
    J. Fraxedas
    J. S. Brooks
    Journal of Low Temperature Physics, 2006, 142 : 397 - 400
  • [44] Chemical vapor deposition - based synthesis of conductive polydopamine thin-films
    Coskun, Halime
    Aljabour, Abdalaziz
    Uiberlacker, Lisa
    Strobel, Moritz
    Hild, Sabine
    Cobet, Christoph
    Farka, Dominik
    Stadler, Philipp
    Sariciftci, Niyazi Serdar
    THIN SOLID FILMS, 2018, 645 : 320 - 325
  • [45] Growth and properties of PbTiO3 thin films by photoenhanced chemical vapor deposition
    Katayama, Takuma, 1600, (30):
  • [46] Growth of titanium silicate thin films by photo-induced chemical vapor deposition
    Wang, ZM
    Fang, Q
    Zhang, JY
    Wu, JX
    Di, Y
    Chen, W
    Chen, ML
    Boyd, IW
    THIN SOLID FILMS, 2004, 453 : 167 - 171
  • [47] Growth of La2NiO4 thin films by chemical vapor deposition
    Faucheux, V.
    Pignard, S.
    Audier, M.
    JOURNAL OF CRYSTAL GROWTH, 2005, 275 (1-2) : E947 - E951
  • [48] Epitaxial Growth of Ferroelectric Thin Films by Combustion Chemical Vapor Deposition and Their Electrical Properties
    Zhao, Zhiyong
    Jiang, Yongdong
    Wang, Xiaoyan
    Choi, Kwang
    Hunt, Andrew T.
    2006 15th IEEE International Symposium on Applications of Ferroelectrics, 2007, : 359 - 362
  • [49] Growth of ZnSe thin films by metalorganic chemical vapor deposition using nitrogen trifluoride
    Noda, Y
    Ishikawa, T
    Yamabe, M
    Hara, Y
    APPLIED SURFACE SCIENCE, 1997, 113 : 28 - 32
  • [50] Growth Regimes of Poly(perfluorodecyl acrylate) Thin Films by Initiated Chemical Vapor Deposition
    Perrotta, Alberto
    Christian, Paul
    Jones, Andrew O. F.
    Muralter, Fabian
    Coclite, Anna Maria
    MACROMOLECULES, 2018, 51 (15) : 5694 - 5703
12345