Molecular engineering applications in the growth of SiC-based thin films by chemical vapor deposition

被引：0
|
作者：
Loboda, M. J. [1 ]
机构：
[1] Dow Corning Corp, Midland, MI 48686 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2009年 / 237卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
204-POLY
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页数：1
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