Phase separation in strained epitaxial InGaN islands

被引:24
作者
Niu, Xiaobin [1 ]
Stringfellow, Gerald B. [1 ,2 ]
Liu, Feng [1 ]
机构
[1] Univ Utah, Dept Mat Sci & Engn, Salt Lake City, UT 84112 USA
[2] Univ Utah, Dept Elect & Comp Engn, Salt Lake City, UT 84112 USA
关键词
gallium compounds; III-V semiconductors; indium compounds; island structure; liquid phase epitaxial growth; Monte Carlo methods; phase separation; semiconductor epitaxial layers; semiconductor growth; surface diffusion; wide band gap semiconductors; MULTIPLE-QUANTUM WELLS;
D O I
10.1063/1.3662927
中图分类号
O59 [应用物理学];
学科分类号
摘要
Phase separation (PS) produces InN composition gradients in InGaN islands, which may be important for light emitting diodes, solar cells, and lasers. Thus, the control of PS is critical, and the kinetic growth process, which is suggested to be important for controlling PS in Stranski-Krastanov islands, becomes a key factor in producing materials for optoelectronic devices. We present atomistic-strain-model Monte Carlo simulations for PS in strained epitaxial InGaN islands. Our simulations illustrate how the PS in InGaN islands depends on the kinetic growth mode and subsurface diffusion, and thus suggest ideas for controlling the microstructure of alloy islands formed during epitaxial growth. (C) 2011 American Institute of Physics. [doi:10.1063/1.3662927]
引用
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页数:3
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