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Swift heavy ion irradiation effects in SiC measured by positrons
被引:10
|作者:
Liszkay, L
Havancsák, K
Barthe, MF
Desgardin, P
Henry, L
Kajcsos, Z
Battistig, G
Szilágyi, E
Skuratov, VA
机构:
[1] KFKI Res Inst Nucl & Particle Phys, HU-1525 Budapest, Hungary
[2] Eotvos Lorand Univ, Dept Solid State Phys, HU-1117 Budapest, Hungary
[3] Ctr Etud Rech Irradiat, CNRS, FR-45071 Orleans, France
[4] Res Inst Tech Phys & Mat Sci, HU-1525 Budapest 114, Hungary
[5] Joint Nucl Res Inst, RU-10100 Moscow, Russia
来源:
POSITRON ANNIHILATION - ICPA-12
|
2001年
/
363-3卷
关键词:
amorphization;
defect profile;
ion implantation;
irradiation;
semiconductors;
Si;
SiC;
swift ions;
TRIM;
D O I:
10.4028/www.scientific.net/MSF.363-365.123
中图分类号:
TH7 [仪器、仪表];
学科分类号:
0804 ;
080401 ;
081102 ;
摘要:
N-type 6H SiC single crystals irradiated with swift (246 MeV) Kx ions at room temperature (the implantation depth being 21 mum) were investigated by conventional positron lifetime and Doppler-broadening measurements as well as with the application of a slow positron beam. The fluence dependence of the irradiation-induced defects was studied in the 1X10(10) - 1x10(14) ion cm(-2) range. In the fluence and depth range studied, no sign of amorphization (or creation of large voids) was seen in the Kr irradiated crystals. The positron annihilation results were compared with atomic displacement calculations by TRIM. A simple model was used to describe the trapping effect and determine the relationship between the atomic displacement densities and the positron trapping. The 225 ps lifetime of the open-volume defects created suggests that the Vsi-Vc divacancy is the dominant trapping site in the implanted zone.
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页码:123 / 125
页数:3
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