ON THE ELECTRONIC TRANSPORT MECHANISM IN MAGNETRON-SPUTTERED POLYCRYSTALLINE ZnO THIN FILMS

被引:3
|
作者
Rusu, I. I. [2 ]
Smirnov, M. [1 ]
Rusu, G. G. [1 ]
Rambu, A. P. [1 ]
Rusu, G. I. [1 ]
机构
[1] Al I Cuza Uiv, Fac Phys, Iasi 700506, Romania
[2] Univ Bacau, Bacau 600115, Romania
来源
关键词
Zinc oxide; thin films; electronic transport; absorption spectra; ZINC-OXIDE; OPTICAL CHARACTERISTICS; GRAIN-BOUNDARIES; RESISTIVITY; CONDUCTION;
D O I
10.1142/S0217979210057602
中图分类号
O59 [应用物理学];
学科分类号
摘要
Zinc oxide (ZnO) thin films were deposited onto glass substrates by d.c. magnetron sputtering. The structural analysis, by X-ray diffraction and atomic force microscopy, indicate that the studied films are polycrystalline and have a wurtzite (hexagonal) structure. The film crystallites are preferentially oriented with (002) planes parallel to the substrates. The mechanism of electronic transport is explained in terms of Seto's model elaborated for polycrystalline semiconducting films (crystallite boundary trapping theory). Some parameters of used model (impurity concentration, density and energy of the trapping states, etc.) have been calculated. The optical bandgap (E-g0 = 3.28 - 3.37 eV) was determined from absorption spectra.
引用
收藏
页码:6079 / 6090
页数:12
相关论文
共 50 条
  • [21] INTRINSIC STRESS OF MAGNETRON-SPUTTERED NIOBIUM FILMS
    WU, CT
    THIN SOLID FILMS, 1979, 64 (01) : 103 - 110
  • [22] Magnetron-sputtered carbon nitride (CNx) films
    Kola, P. V.
    Cameron, D. C.
    Meenan, B. J.
    Pischow, K. A.
    Anderson, C. A.
    Brown, N. M. D.
    Hashmi, M. S. J.
    SURFACE & COATINGS TECHNOLOGY, 1995, 74-75 (1-3): : 696 - 703
  • [23] Grain growth in magnetron-sputtered nickel films
    Wagner, T
    Müller, D
    ZEITSCHRIFT FUR METALLKUNDE, 2002, 93 (05): : 401 - 405
  • [24] PROPERTIES OF DC MAGNETRON-SPUTTERED LEAD ZIRCONATE TITANATE THIN-FILMS
    SREENIVAS, K
    SAYER, M
    GARRETT, P
    THIN SOLID FILMS, 1989, 172 (02) : 251 - 267
  • [25] Magnetron-sputtered carbon nitride (CNx) films
    Kola, P.V.
    Cameron, D.C.
    Meenan, B.J.
    Pischow, K.A.
    Anderson, C.A.
    Brown, N.M.D.
    Hashmi, M.S.J.
    Surface and Coatings Technology, 1995, 75 (1 -3 pt 2) : 696 - 703
  • [26] DC Magnetron-Sputtered Mo Thin Films with High Adhesion, Conductivity and Reflectance
    Ahmed, Nisar
    Iqbal, Muhammad Azhar
    Khan, Zuhair Subhani
    Qayyum, Ahmed Abdul
    JOURNAL OF ELECTRONIC MATERIALS, 2020, 49 (07) : 4221 - 4230
  • [27] DC Magnetron-Sputtered Mo Thin Films with High Adhesion, Conductivity and Reflectance
    Nisar Ahmed
    Muhammad Azhar Iqbal
    Zuhair Subhani Khan
    Ahmed Abdul Qayyum
    Journal of Electronic Materials, 2020, 49 : 4221 - 4230
  • [28] Electrical Neel-Order Switching in Magnetron-Sputtered CuMnAs Thin Films
    Matalla-Wagner, T.
    Rath, M-F
    Graulich, D.
    Schmalhorst, J-M
    Reiss, G.
    Meinert, M.
    PHYSICAL REVIEW APPLIED, 2019, 12 (06)
  • [29] In situ stress evolution in magnetron-sputtered Si-based thin films
    Fang, M. (fm@siom.ac.cn), 1600, Editorial Office of High Power Laser and Particle Beams, P.O. Box 919-805, Mianyang, 621900, China (25):
  • [30] Structural and mechanical properties of magnetron-sputtered Al-Au thin films
    Azadmanjiri, Jalal
    Wang, James
    Berndt, Christopher C.
    Wen, Cuie
    Srivastava, Vijay K.
    Kapoor, Ajay
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2017, 123 (01):