Accurate ab initio density fitting for multiconfigurational self-consistent field methods

被引:157
|
作者
Aquilante, Francesco [1 ]
Pedersen, Thomas Bondo [1 ]
Lindh, Roland [1 ]
Roos, Bjoern Olof [1 ]
De Meras, Alfredo Sanchez [2 ]
Koch, Henrik [3 ]
机构
[1] Lund Univ, Dept Theoret Chem, Ctr Chem, S-22100 Lund, Sweden
[2] Univ Valencia, Dept Phys Chem, Inst Mol Sci, E-46100 Burjassot, Spain
[3] Norwegian Univ Sci & Technol, Dept Chem, N-7491 Trondheim, Norway
来源
JOURNAL OF CHEMICAL PHYSICS | 2008年 / 129卷 / 02期
基金
日本科学技术振兴机构;
关键词
D O I
10.1063/1.2953696
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using Cholesky decomposition and density fitting to approximate the electron repulsion integrals, an implementation of the complete active space self-consistent field (CASSCF) method suitable for large-scale applications is presented. Sample calculations on benzene, diaquo-tetra-mu-acetato-dicopper(II), and diuraniumendofullerene demonstrate that the Cholesky and density fitting approximations allow larger basis sets and larger systems to be treated at the CASSCF level of theory with controllable accuracy. While strict error control is an inherent property of the Cholesky approximation, errors arising from the density fitting approach are managed by using a recently proposed class of auxiliary basis sets constructed from Cholesky decomposition of the atomic electron repulsion integrals. (c) 2008 American Institute of Physics.
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页数:8
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