High-resolution laser fabrication of amplitude diffractive structures on thin metal films

被引：1

作者：

Korolkov, Victor P. ^{[1
]}

Mikerin, Sergey L. ^{[1
]}

Okotrub, Konstantin A. ^{[1
]}

Sametov, Alexander R. ^{[1
]}

Malyshev, Anatoly I. ^{[1
]}

机构：

[1] Inst Automat & Electrometry SB RAS, 1 Koptyuga Ave, Novosibirsk 630090, Russia

来源：

NANOPHOTONICS AND MICRO/NANO OPTICS IV | 2018年 / 10823卷

基金：

俄罗斯科学基金会;

关键词：

direct laser writing; thin metal films; oxidation; spatial resolution; amplitude diffractive structures; thermochemical; OXIDATION;

D O I：

10.1117/12.2501246

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thermochemical direct laser writing of amplitude diffractive structures on thin metal films (Zr, Ta, V, Mo, Cr) at different processing conditions with focused cw laser beam has been experimentally investigated. The study was aimed to select proper material and thickness range ensuring through oxidation, which helps to get higher resolution due to bleaching of the thin absorbing film near peak of intensity distribution of focused laser beam and stopping thermal trace widening. The resistless thermal writing process will be further used as base for developing high-resolution laser lithography system with 266 nm DPSS laser intended for nano-optics fabrication.

引用

页数：11

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