Development and evaluation of a DC of high voltage power supply for use in deposition system of thin films by sputtering with copper

被引：10

作者：

Baptista Machuno, Luis Gustavo ^{[1
]}

Lima, Anderson Barbosa ^{[1
]}

Buso, Rafael Rocha ^{[1
]}

Favarato Abdanur, Rubens Miguel ^{[1
]}

Rangel, Elidiane Cipriano ^{[2
]}

Gelamo, Rogerio Valentim ^{[1
]}

机构：

[1] LFFPP ICTE UFTM, Lab Filmes Finos & Proc Plasma, BR-38060280 Uberaba, MG, Brazil

[2] LaPTec, Lab Plasmas Tecnol, BR-18087180 Sorocaba, SP, Brazil

来源：

MATERIA-RIO DE JANEIRO | 2016年 / 21卷 / 02期

关键词：

PROTECTION; SOLIDS;

D O I：

10.1590/S1517-707620160002.0046

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：492 / 500

页数：9

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