Normal-incidence, multiple-energy Kikuchi electron diffraction patterns (holograms) have been measured for clean GaAs(001) surface and for thin NaCl films epitaxially grown on a GaAs(001) substrate. Three-dimensional atomic images of both structures have been obtained directly by the integral-energy phase-summing method. For the clean semiconductor surface, the superimposed images of Ga and As bulk atoms were well resolved within an accuracy of 0.5 Angstrom. A distinctly different local atomic configuration was found after the deposition of the epitaxial NaCl film. Possible models of the NaCl/GaAs(001) epitaxy are discussed. A detailed analysis of the reconstructed diffraction patterns revealed that an initial formation of the Cl-Ga bond occurred in the system, and after deposition of 5 ML NaCl, the substrate was uniformly covered by a layer at least 3 ML thick. (C) 1999 Elsevier Science B.V. All rights reserved.
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Univ Ulsan, Dept Phys, Ulsan 680749, South KoreaUniv Ulsan, Dept Phys, Ulsan 680749, South Korea
Duong Anh Tuan
Dang Duc Dung
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Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
Ha Noi Univ Sci & Technol, Dept Gen Phys, Sch Engn Phys, Hanoi, VietnamUniv Ulsan, Dept Phys, Ulsan 680749, South Korea
Dang Duc Dung
Vo Thanh Son
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Chungnam Natl Univ, Ctr Nanobioenineering, Taejon 350746, South Korea
Chungnam Natl Univ, Ctr Spintron, Taejon 350746, South KoreaUniv Ulsan, Dept Phys, Ulsan 680749, South Korea
Vo Thanh Son
Shin, Yooleemi
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Univ Ulsan, Dept Phys, Ulsan 680749, South KoreaUniv Ulsan, Dept Phys, Ulsan 680749, South Korea
Shin, Yooleemi
Cho, Sunglae
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Univ Ulsan, Dept Phys, Ulsan 680749, South KoreaUniv Ulsan, Dept Phys, Ulsan 680749, South Korea