Holographic inversion of Kikuchi electron diffraction patterns for thin epitaxial NaCl films grown on GaAs(001)

被引:6
|
作者
Korecki, P
Pigtkowski, P
Szymonski, M
机构
[1] Jagiellonian Univ, Inst Phys, PL-30059 Krakow, Poland
[2] Jagiellonian Univ, Reg Lab Physicochem Anal, PL-30059 Krakow, Poland
关键词
alkali halides; electron holography; electron-solid diffraction; gallium arsenide; molecular beam epitaxy; semiconductor-insulator interface; surface structure;
D O I
10.1016/S0039-6028(99)00102-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Normal-incidence, multiple-energy Kikuchi electron diffraction patterns (holograms) have been measured for clean GaAs(001) surface and for thin NaCl films epitaxially grown on a GaAs(001) substrate. Three-dimensional atomic images of both structures have been obtained directly by the integral-energy phase-summing method. For the clean semiconductor surface, the superimposed images of Ga and As bulk atoms were well resolved within an accuracy of 0.5 Angstrom. A distinctly different local atomic configuration was found after the deposition of the epitaxial NaCl film. Possible models of the NaCl/GaAs(001) epitaxy are discussed. A detailed analysis of the reconstructed diffraction patterns revealed that an initial formation of the Cl-Ga bond occurred in the system, and after deposition of 5 ML NaCl, the substrate was uniformly covered by a layer at least 3 ML thick. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:22 / 30
页数:9
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