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Holographic inversion of Kikuchi electron diffraction patterns for thin epitaxial NaCl films grown on GaAs(001)
被引:6
|作者:
Korecki, P
Pigtkowski, P
Szymonski, M
机构:
[1] Jagiellonian Univ, Inst Phys, PL-30059 Krakow, Poland
[2] Jagiellonian Univ, Reg Lab Physicochem Anal, PL-30059 Krakow, Poland
关键词:
alkali halides;
electron holography;
electron-solid diffraction;
gallium arsenide;
molecular beam epitaxy;
semiconductor-insulator interface;
surface structure;
D O I:
10.1016/S0039-6028(99)00102-8
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
Normal-incidence, multiple-energy Kikuchi electron diffraction patterns (holograms) have been measured for clean GaAs(001) surface and for thin NaCl films epitaxially grown on a GaAs(001) substrate. Three-dimensional atomic images of both structures have been obtained directly by the integral-energy phase-summing method. For the clean semiconductor surface, the superimposed images of Ga and As bulk atoms were well resolved within an accuracy of 0.5 Angstrom. A distinctly different local atomic configuration was found after the deposition of the epitaxial NaCl film. Possible models of the NaCl/GaAs(001) epitaxy are discussed. A detailed analysis of the reconstructed diffraction patterns revealed that an initial formation of the Cl-Ga bond occurred in the system, and after deposition of 5 ML NaCl, the substrate was uniformly covered by a layer at least 3 ML thick. (C) 1999 Elsevier Science B.V. All rights reserved.
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页码:22 / 30
页数:9
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