Some electrical properties of polyaniline/p-Si/Al structure at 300 K and 77 K temperatures

被引:97
作者
Aydogan, S. [1 ]
Saglam, M. [1 ]
Tueruet, A. [1 ]
机构
[1] Ataturk Univ, Fac Sci & Arts, Dept Phys, TR-25240 Erzurum, Turkey
关键词
polyaniline; series resistance; Schottky contact; current voltage characteristics; organic/inorganic junction;
D O I
10.1016/j.mee.2007.06.004
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical characterization of the PANI/p-Si/Al structure has been investigated by using current-voltage (I-V), capacitance-voltage (C-V) and capacitance-frequency (C-f) characteristics. Especially, some characteristics have been compared with the 300 K temperature characteristics at liquid nitrogen temperature. The characteristic parameters of the structure such as barrier height, ideality factor and series resistance have been determined from the current-voltage measurements. According to the C-V characteristics, the higher values of capacitance at low frequencies and high temperature have been attributed to the excess capacitance resulting from the interface states in equilibrium with the p-Si, which can follow the a.c. signal. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:278 / 283
页数:6
相关论文
共 26 条
[1]   On the barrier inhomogeneities of polyaniline/p-Si/Al structure at low temperature [J].
Aydogan, S ;
Saglam, M ;
Türüt, A .
APPLIED SURFACE SCIENCE, 2005, 250 (1-4) :43-49
[2]   Characterization of capacitance-frequency features of Sn/polypyrrole/n-Si structure as a function of temperature [J].
Aydogan, S ;
Saglam, M ;
Türüt, A .
POLYMER, 2005, 46 (16) :6148-6153
[3]   The effects of the temperature on current-voltage characteristics of Sn/polypyrrole/n-Si structures [J].
Aydogan, S ;
Saglam, M ;
Türüt, A ;
Onganer, Y .
SYNTHETIC METALS, 2005, 150 (01) :15-20
[4]   The effects of the temperature on the some parameters obtained from current-voltage and capacitance-voltage characteristics of polypyrrole/n-Si structure [J].
Aydogan, S ;
Saglam, M ;
Türüt, A .
POLYMER, 2005, 46 (02) :563-568
[5]   The effect of series resistance on calculation of the interface state density distribution in Schottky diodes [J].
Ayyildiz, E ;
Temirci, C ;
Bati, B ;
Türüt, A .
INTERNATIONAL JOURNAL OF ELECTRONICS, 2001, 88 (06) :625-633
[6]   Electron transport and barrier inhomogeneities in palladium silicide Schottky diodes [J].
Chand, S ;
Kumar, J .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1997, 65 (4-5) :497-503
[7]   EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].
CHEUNG, SK ;
CHEUNG, NW .
APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87
[8]   POLYANILINE - PROTONIC ACID DOPING OF THE EMERALDINE FORM TO THE METALLIC REGIME [J].
CHIANG, JC ;
MACDIARMID, AG .
SYNTHETIC METALS, 1986, 13 (1-3) :193-205
[9]   Temperature dependence of reverse bias capacitance-voltage characteristics of Sn/p-GaTe Schottky diodes [J].
Coskun, C ;
Aydogan, S ;
Efeoglu, H .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2004, 19 (02) :242-246
[10]   TRANSPARENT AND OPAQUE SCHOTTKY CONTACTS ON UNDOPED IN0.52AL0.48AS GROWN BY MOLECULAR-BEAM EPITAXY [J].
GAO, W ;
BERGER, PR ;
HUNSPERGER, RG ;
ZYDZIK, G ;
RHODES, WW ;
OBRYAN, HM ;
SIVCO, D ;
CHO, AY .
APPLIED PHYSICS LETTERS, 1995, 66 (25) :3471-3473