Continuously tunable photoluminescence from Si+-implanted and thermally annealed SiO2 films

被引:36
作者
Fischer, T
PetrovaKoch, V
Shcheglov, K
Brandt, MS
Koch, F
机构
[1] CALTECH,DEPT APHI88,PASADENA,CA 91125
[2] TECH UNIV MUNICH,WALTER SCHOTTKY INST,D-85747 GARCHING,GERMANY
关键词
luminescence; ion implantation; silicon; silicon dioxide;
D O I
10.1016/0040-6090(95)08112-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Efficient visible room-temperature photoluminescence, that can be continuously tuned from the blue (2.8 eV) to the red in successive annealing steps, is observed for Si+-implanted thermal oxide layers on (100) Si wafers. It is shown that the electron spin resonance signal is reduced by the annealing while the luminescence increases in intensity. From this observation we conclude that the red band of the tunable luminescence in the 1.9 eV range is not caused by a paramagnetic point defect. The observation of Si-crystallites in transmission electron microscopy leads us to argue that the red shift in the photoluminescence is the same size-related effect known from porous Si.
引用
收藏
页码:100 / 103
页数:4
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