Continuously tunable photoluminescence from Si+-implanted and thermally annealed SiO2 films

被引:36
|
作者
Fischer, T
PetrovaKoch, V
Shcheglov, K
Brandt, MS
Koch, F
机构
[1] CALTECH,DEPT APHI88,PASADENA,CA 91125
[2] TECH UNIV MUNICH,WALTER SCHOTTKY INST,D-85747 GARCHING,GERMANY
关键词
luminescence; ion implantation; silicon; silicon dioxide;
D O I
10.1016/0040-6090(95)08112-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Efficient visible room-temperature photoluminescence, that can be continuously tuned from the blue (2.8 eV) to the red in successive annealing steps, is observed for Si+-implanted thermal oxide layers on (100) Si wafers. It is shown that the electron spin resonance signal is reduced by the annealing while the luminescence increases in intensity. From this observation we conclude that the red band of the tunable luminescence in the 1.9 eV range is not caused by a paramagnetic point defect. The observation of Si-crystallites in transmission electron microscopy leads us to argue that the red shift in the photoluminescence is the same size-related effect known from porous Si.
引用
收藏
页码:100 / 103
页数:4
相关论文
共 50 条
  • [1] Visible photoluminescence in thermally annealed Bi implanted SiO2 films
    Komatsu, M
    Oyoshi, K
    Hishita, S
    Matsuishi, K
    Onari, S
    Arai, T
    MATERIALS CHEMISTRY AND PHYSICS, 1998, 54 (1-3) : 286 - 288
  • [2] Visible electroluminescence from Si+-implanted SiO2 films thermally grown on crystalline Si
    Liao, LS
    Bao, XM
    Li, NS
    Zheng, XQ
    Min, NB
    SOLID STATE COMMUNICATIONS, 1996, 97 (12) : 1039 - 1042
  • [3] Improvement of photoluminescence mechanism of CTA-treated Si+-implanted SiO2 films by using RTA
    Tsai, Jen-Hwan
    Fu, Ming-Yue
    JOURNAL OF LUMINESCENCE, 2010, 130 (10) : 1680 - 1686
  • [4] Time-resolved photoluminescence of implanted SiO2:Si+ films
    Zatsepin, A. F.
    Pustovarov, V. A.
    Kortov, V. S.
    Buntov, E. A.
    Fitting, H. -J.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2009, 355 (18-21) : 1119 - 1122
  • [5] Photoluminescence from C~+ -implanted SiO2 films thermally grown on crystalline silicon
    廖良生
    侯晓远
    Progress in Natural Science, 1997, (04) : 107 - 111
  • [6] Photoluminescence studies of light emission from silicon implanted and annealed SiO2 layers
    Mutti, P
    Ghislotti, G
    Meda, L
    Grilli, E
    Guzzi, M
    Zanghieri, L
    Cubeddu, R
    Pifferi, A
    Taroni, P
    Torricelli, A
    THIN SOLID FILMS, 1996, 276 (1-2) : 88 - 91
  • [7] Photoluminescence from C+-implanted SiO2 films thermally grown on crystalline silicon
    Liao, LS
    Hou, XY
    PROGRESS IN NATURAL SCIENCE, 1997, 7 (04) : 489 - 493
  • [8] Scanning near-field cathodoluminescence microscopy of an Si+ implanted and thermally annealed SiO2 layer
    Fauré, J
    Pastré, D
    Muller, D
    Troyon, M
    PHYSICS LETTERS A, 1999, 255 (03) : 187 - 190
  • [9] Effects of thermal annealing on photoluminescence of Si+/C+ implanted SiO2 films
    Chen, Yin-Yu
    Chao, Der-Sheng
    Tsai, Hsu-Sheng
    Liang, Jenq-Horng
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2016, 372 : 114 - 118
  • [10] The effect of annealing under hydrostatic pressure on the visible photoluminescence from Si+-ion implanted SiO2 films
    Tyschenko, IE
    Rebohle, L
    Yankov, RA
    Skorupa, W
    Misiuk, A
    Kachurin, GA
    JOURNAL OF LUMINESCENCE, 1998, 80 (1-4) : 229 - 233