Structure and magnetic anisotropy in L10 ordered FePd thin films

被引：9

作者：

Ha, J. G. ^{[1
]}

Chung, I. S. ^{[1
]}

Kang, J. G. ^{[1
]}

An, H. W. ^{[1
]}

Koh, J. H. ^{[1
]}

Koo, S. M. ^{[1
]}

Cho, Y. H. ^{[2
]}

Park, S. Y. ^{[2
]}

Jung, M. H. ^{[2
]}

Kim, J. G. ^{[3
]}

机构：

[1] Kwangwoon Univ, Dept Elect Mat Engn, Seoul 139701, South Korea

[2] Korea Basic Sci Inst, Quantum Mat Res Team, Taejon 305333, South Korea

[3] Korean Intellectual Property Off, Inorgan Chem Examinat Div, Taejon 302701, South Korea

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2007年 / 204卷 / 12期

关键词：

Thin films;

D O I：

10.1002/pssa.200777364

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Epitaxial L1(0) FePd (001) thin films were successfully manufactured by sputtering deposition method. The structure and magnetic properties of FePd thin films were characterized as a function of Fe compositions. It was found that the order parameter had a maximum for the stoichiometric composition, whereas the magnetic anisotropy had a maximum as the Pd content is increased to slightly above the stoichiometric composition. This indicates that the stoichiometry is directly contributed to the chemical ordering and the magnetic anisotropy. These results imply that nonstoichiometric FePd compositions, with a slight excess of Pd, may in fact be preferred for applications that require high magnetic anisotropy. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：4045 / 4048

页数：4

共 4 条

[1] Surface morphology and chemical ordering in FePd/Pd(001) thin layers [J].

Halley, D ;

Samson, Y ;

Marty, A ;

Beigné, C ;

Gilles, B .

SURFACE SCIENCE, 2001, 481 (1-3) :25-32

[2] Hard magnetic properties of (001) oriented L10-FePd nanoparticles formed at 773 K [J].

Sato, K ;

Bian, B ;

Hirotsu, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (11B) :L1121-L1123

[3] L10 ordering of off-stoichiometric FePt(001) thin films at reduced temperature [J].

Seki, T ;

Shima, T ;

Takanashi, K ;

Takahashi, Y ;

Matsubara, E ;

Hono, K .

APPLIED PHYSICS LETTERS, 2003, 82 (15) :2461-2463

[4] High Ku materials approach to 100 Gbits/in2 [J].

Weller, D ;

Moser, A ;

Folks, L ;

Best, ME ;

Lee, W ;

Toney, MF ;

Schwickert, M ;

Thiele, JU ;

Doerner, MF .

IEEE TRANSACTIONS ON MAGNETICS, 2000, 36 (01) :10-15

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