Formation of carbonic nanostructures using PECVD and glow-discharge plasma at direct current

In this research the process of formation carbonic nanostructures using low temperatures was studied. Nanostructures were formed using PECVD and glow-discharge plasma. The research was carried out at temperature range between 300 degrees C - 700 degrees C. The influence of Ni catalyst thickness and concentration of carbon-containing component in vapour phase on the structure of carbonic deposit was studied. Consequently we attained productive growth of both the homogeneous vertical nanotubes and graphene flakes array at low temperature (350 degrees C). Electrophysical features of obtained structures were examined.