Microscopic identification of the compensation mechanisms in Si-doped GaAs

被引:117
作者
Domke, C
Ebert, P
Heinrich, M
Urban, K
机构
[1] Institut für Festkörperforschung, Forschungszentrum Jülich GmbH
来源
PHYSICAL REVIEW B | 1996年 / 54卷 / 15期
关键词
D O I
10.1103/PhysRevB.54.10288
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The compensation mechanisms of Si-Ga donors in GaAs are determined by scanning tunneling microscopy. With increasing Si concentration the Si-Ga donors are consecutively electrically deactivated by Si-As accepters, Si clusters, and Si-Ga-Ga-vacancy complexes. A microscopic model based on the screened Coulomb interaction between charged dopants, the amphoteric nature of Si, and the Fermi-level effect is proposed, It explains the observed defects, the critical Si concentrations of each identified mechanism, and predicts the solubility limit of Si in GaAs.
引用
收藏
页码:10288 / 10291
页数:4
相关论文
共 25 条
[21]   THERMAL-EQUILIBRIUM CONCENTRATIONS AND EFFECTS OF NEGATIVELY CHARGED GA VACANCIES IN N-TYPE GAAS [J].
TAN, TY ;
YOU, HM ;
GOSELE, UM .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 56 (03) :249-258
[22]   ELECTRON LOCALIZATION BY A METASTABLE DONOR LEVEL IN N-GAAS - A NEW MECHANISM LIMITING THE FREE-CARRIER DENSITY [J].
THEIS, TN ;
MOONEY, PM ;
WRIGHT, SL .
PHYSICAL REVIEW LETTERS, 1988, 60 (04) :361-364
[23]  
WHELAN JM, 1961, P INT C SEM PHYS PRA, P943
[24]   SCANNING-TUNNELING-MICROSCOPY STUDIES OF SI DONORS (SI-GA) IN GAAS [J].
ZHENG, JF ;
LIU, X ;
NEWMAN, N ;
WEBER, ER ;
OGLETREE, DF ;
SALMERON, M .
PHYSICAL REVIEW LETTERS, 1994, 72 (10) :1490-1493
[25]  
ZHENG JF, 1994, APPL PHYS LETT, V64, P1836