Microscopic identification of the compensation mechanisms in Si-doped GaAs

被引:117
作者
Domke, C
Ebert, P
Heinrich, M
Urban, K
机构
[1] Institut für Festkörperforschung, Forschungszentrum Jülich GmbH
来源
PHYSICAL REVIEW B | 1996年 / 54卷 / 15期
关键词
D O I
10.1103/PhysRevB.54.10288
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The compensation mechanisms of Si-Ga donors in GaAs are determined by scanning tunneling microscopy. With increasing Si concentration the Si-Ga donors are consecutively electrically deactivated by Si-As accepters, Si clusters, and Si-Ga-Ga-vacancy complexes. A microscopic model based on the screened Coulomb interaction between charged dopants, the amphoteric nature of Si, and the Fermi-level effect is proposed, It explains the observed defects, the critical Si concentrations of each identified mechanism, and predicts the solubility limit of Si in GaAs.
引用
收藏
页码:10288 / 10291
页数:4
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