Electrochemical deposition of MoS2 thin films by reduction of tetrathiomolybdate

被引：130
作者：
Ponomarev, EA
NeumannSpallart, M
Hodes, G
LevyClement, C
机构：
[1] CNRS,PHYS SOLIDES BELLEVUE LAB,UPR 1332,F-92195 MEUDON,FRANCE
[2] WEIZMANN INST SCI,DEPT MAT & INTERFACES,IL-76100 REHOVOT,ISRAEL
来源：
THIN SOLID FILMS | 1996年 / 280卷 / 1-2期
关键词：
electrochemistry; semiconductors; molybdenum disulphide; deposition process;
D O I：
10.1016/0040-6090(95)08204-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Molybdenum sulphide was cathodically electrodeposited from aqueous solutions of sodium tetrathiomolybdate. The as-deposited films were X-ray amorphous with a composition, measured by microprobe analysis, close to MoS2. Annealing these films in Ar resulted in highly-textured films of MoS, with the van der Waals planes parallel to the substrate. A small expansion in the c spacing of the annealed films was explained by the presence of oxygen in the crystals. A direct bandgap of 1.78 eV was found for the annealed films.
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页码：86 / 89
页数：4
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