Spin pump induced inverse spin Hall effect observed in Bi-doped n-type Si

被引:7
作者
Ezhevskii, A. A. [1 ]
Guseinov, D. V. [1 ]
Soukhorukov, A. V. [1 ]
Novikov, A. V. [2 ]
Yurasov, D. V. [2 ]
Gusev, N. S. [2 ]
机构
[1] Lobachevsky State Univ Nizhny Novgorod, 23 Pr Gagarina Gagarin Ave, Nizhnii Novgorod 603950, Russia
[2] Russian Acad Sci, Inst Phys Microstruct, GSP-105, Afonino 603950, Nizhny Novgorod, Russia
基金
俄罗斯科学基金会;
关键词
EXCITATION; SILICON;
D O I
10.1103/PhysRevB.101.195202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An inverse spin Hall effect (ISHE) in n-type silicon was observed experimentally when conduction electrons were scattered on the spin-orbit potential of bismuth. The spin current in the silicon layer was generated by excitation of the magnetization precession during ferromagnetic resonance in a thin Permalloy (Py) layer deposited on a Si layer doped by phosphor and bismuth. From the angular dependences of the dc voltage for different Py/n-Si:Bi structures aligned along the [011] or [100] crystal axes, we were able to distinguish the planar Hall effect (PHE) and ISHE contributions. The ISHE dc voltage signal was proportional to the sin theta sin 2 theta product for the structure aligned to the [011] crystal axis and to sin theta cos 2 theta for the [100] direction. In addition, the PHE dc voltage was observed for the angles corresponding to the sin 2 theta dependence. This means that for silicon as a many-valley semiconductor, the scattering of spins due to the spin-orbit potential induced by shallow donor in n-type material is dependent on the orientation of the valley axes relative to the direction of the magnetic field.
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页数:7
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