Experimental and modeling study of the capacitance-voltage characteristics of metal-insulator-semiconductor capacitor based on pentacene/parylene

被引:14
|
作者
Wondmagegn, W. T. [1 ]
Satyala, N. T. [1 ]
Mejia-Silva, I. [2 ]
Mao, D. [2 ]
Gowrisanker, S. [2 ]
Alshareef, H. N. [3 ]
Stiegler, H. J. [2 ]
Quevedo-Lopez, M. A. [2 ]
Pieper, R. J. [1 ]
Gnade, B. E. [2 ]
机构
[1] Univ Texas Tyler, Dept Elect Engn, Tyler, TX 75799 USA
[2] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
[3] King Abdullah Univ Sci & Technol, Dept Mat Sci & Engn, Thuwal 239556900, Saudi Arabia
关键词
Pentacene; Interface; Defects; Poole-Frenkel; Capacitance; Dispersion; THIN-FILM TRANSISTORS; FIELD-DEPENDENT MOBILITY; ELECTRICAL CHARACTERISTICS; INTERFACE STATES; ORGANIC SEMICONDUCTOR; THRESHOLD VOLTAGE; HIGH-PERFORMANCE; CONTACT BARRIER; DEVICES; TEMPERATURE;
D O I
10.1016/j.tsf.2011.02.014
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The capacitance-voltage (C-V) characteristics of metal-insulator-semiconductor (MIS) capacitors consisting of pentacene as an organic semiconductor and parylene as the dielectric have been investigated by experimental, analytical, and numerical analysis. The device simulation was performed using two-dimensional drift-diffusion methods taking into account the Poole-Frenkel field-dependent mobility. Pentacene bulk defect states and fixed charge density at the semiconductor/insulator interface were incorporated into the simulation. The analysis examined pentacene/parylene interface characteristics for various parylene thicknesses. For each thickness, the corresponding flat band voltage extracted from the C-V plot of the MIS structure was more negative than -2.4 V. From the flat band voltage the existence of a significant mismatch between the work functions of the gate electrode and pentacene active material has been identified. Experimental and simulation results suggest the existence of interface charge density on the order of 3 x 10(11) q/cm(2) at the insulator/semiconductor interface. The frequency dispersion characteristics of the device are also presented and discussed. (c) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:4313 / 4318
页数:6
相关论文
共 50 条
  • [41] Capacitance-Voltage Fluctuation of SixNy-Based Metal-Insulator-Metal Capacitor Due to Silane Surface Treatment
    Choi, Tae-Min
    Jung, Eun-Su
    Yoo, Jin-Uk
    Lee, Hwa-Rim
    Pyo, Sung-Gyu
    MICROMACHINES, 2024, 15 (10)
  • [42] Nonmonotonous Capacitance-Voltage Characteristics in Metal-Glass-Semiconductor Structures
    Vlasov, S. I.
    Nasirov, A. A.
    Mamatkarimov, O. O.
    Ergasheva, M. A.
    SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY, 2008, 44 (03) : 250 - 251
  • [43] Nonmonotonous capacitance-voltage characteristics in metal-glass-semiconductor structures
    S. I. Vlasov
    A. A. Nasirov
    O. O. Mamatkarimov
    M. A. Ergasheva
    Surface Engineering and Applied Electrochemistry, 2008, 44
  • [44] Current and capacitance characteristics of a metal-insulator-semiconductor structure with an ultrathin oxide layer
    Fu, Y
    Willander, M
    Lundgren, P
    SUPERLATTICES AND MICROSTRUCTURES, 2001, 30 (02) : 53 - 60
  • [45] Charge retention characteristics in a metal-insulator-semiconductor capacitor containing Ge nanocrystals
    Kim, Y
    Cheong, HJ
    Park, KH
    Chung, TH
    Bark, HJ
    Yi, JY
    Bang, SH
    Cho, JH
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2002, 17 (10) : 1039 - 1043
  • [46] Calculation of the capacitance-voltage characteristics of a metal-insulator-correlated oxide capacitor with dynamical mean-field theory
    Bakalov, Petar
    Ydens, Bart
    Locquet, Jean-Pierre
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2014, 211 (02): : 440 - 443
  • [47] Capacitance-voltage modeling of metal-ferroelectric-semiconductor capacitors based on epitaxial oxide heterostructures
    Choi, Woong
    Kim, Sunkook
    Jin, Yong Wan
    Lee, Sang Yoon
    Sands, Timothy D.
    APPLIED PHYSICS LETTERS, 2011, 98 (10)
  • [49] Comprehensive study on the deep depletion capacitance-voltage behavior for metal-oxide-semiconductor capacitor with ultrathin oxides
    Cheng, Jen-Yuan
    Huang, Chiao-Ti
    Hwu, Jenn-Gwo
    JOURNAL OF APPLIED PHYSICS, 2009, 106 (07)
  • [50] MEASUREMENT OF CAPACITANCE-VOLTAGE CHARACTERISTICS OF METAL - OXIDE - SEMICONDUCTOR STRUCTURES BY PULSE METHOD
    BLOMNIEK, EA
    KONTSEVO.YA
    TEMPER, EM
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1968, 1 (08): : 1061 - &