Experimental and modeling study of the capacitance-voltage characteristics of metal-insulator-semiconductor capacitor based on pentacene/parylene

被引:14
|
作者
Wondmagegn, W. T. [1 ]
Satyala, N. T. [1 ]
Mejia-Silva, I. [2 ]
Mao, D. [2 ]
Gowrisanker, S. [2 ]
Alshareef, H. N. [3 ]
Stiegler, H. J. [2 ]
Quevedo-Lopez, M. A. [2 ]
Pieper, R. J. [1 ]
Gnade, B. E. [2 ]
机构
[1] Univ Texas Tyler, Dept Elect Engn, Tyler, TX 75799 USA
[2] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
[3] King Abdullah Univ Sci & Technol, Dept Mat Sci & Engn, Thuwal 239556900, Saudi Arabia
关键词
Pentacene; Interface; Defects; Poole-Frenkel; Capacitance; Dispersion; THIN-FILM TRANSISTORS; FIELD-DEPENDENT MOBILITY; ELECTRICAL CHARACTERISTICS; INTERFACE STATES; ORGANIC SEMICONDUCTOR; THRESHOLD VOLTAGE; HIGH-PERFORMANCE; CONTACT BARRIER; DEVICES; TEMPERATURE;
D O I
10.1016/j.tsf.2011.02.014
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The capacitance-voltage (C-V) characteristics of metal-insulator-semiconductor (MIS) capacitors consisting of pentacene as an organic semiconductor and parylene as the dielectric have been investigated by experimental, analytical, and numerical analysis. The device simulation was performed using two-dimensional drift-diffusion methods taking into account the Poole-Frenkel field-dependent mobility. Pentacene bulk defect states and fixed charge density at the semiconductor/insulator interface were incorporated into the simulation. The analysis examined pentacene/parylene interface characteristics for various parylene thicknesses. For each thickness, the corresponding flat band voltage extracted from the C-V plot of the MIS structure was more negative than -2.4 V. From the flat band voltage the existence of a significant mismatch between the work functions of the gate electrode and pentacene active material has been identified. Experimental and simulation results suggest the existence of interface charge density on the order of 3 x 10(11) q/cm(2) at the insulator/semiconductor interface. The frequency dispersion characteristics of the device are also presented and discussed. (c) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:4313 / 4318
页数:6
相关论文
共 50 条
  • [31] Modeling of nonlinearities in the capacitance-voltage characteristics of high-k metal-insulator-metal capacitors
    Gonon, P.
    Vallee, C.
    APPLIED PHYSICS LETTERS, 2007, 90 (14)
  • [32] Capacitance and conductance characteristics of silicon nanocrystal metal-insulator-semiconductor devices
    Flynn, C.
    Koenig, D.
    Perez-Wurfl, I.
    Conibeer, G.
    Green, M. A.
    SOLID-STATE ELECTRONICS, 2009, 53 (05) : 530 - 539
  • [33] SPECIAL FEATURES OF CAPACITANCE-VOLTAGE CHARACTERISTICS OF VARIABLE-GAP METAL-INSULATOR SEMICONDUCTOR STRUCTURES
    VARLAMOV, IV
    VYUKOV, LA
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1987, 21 (06): : 650 - 652
  • [34] The peculiarity of capacitance-voltage characteristics of the metal-insulator-nanowire structure
    Petrosyan, S. G.
    Nersesyan, S. R.
    SEMICONDUCTOR PHYSICS QUANTUM ELECTRONICS & OPTOELECTRONICS, 2022, 25 (03) : 289 - 293
  • [35] Capacitance-voltage characteristics of Floating Gate Electrolyte-Insulator-Semiconductor capacitors
    Jakobson, CG
    Sudakov-Boreysha, L
    Feinsod, M
    Dinar, U
    Nemirovsky, Y
    21ST IEEE CONVENTION OF THE ELECTRICAL AND ELECTRONIC ENGINEERS IN ISRAEL - IEEE PROCEEDINGS, 2000, : 61 - 64
  • [36] On current-voltage and capacitance-voltage characteristics of metal-semiconductor contacts
    Turut, Abdulmecit
    TURKISH JOURNAL OF PHYSICS, 2020, 44 (04): : 302 - 347
  • [37] Determination of the Parameters of Metal-Insulator-Semiconductor Structures with Ultrathin Insulating Layer from High-Frequency Capacitance-Voltage Measurements
    Goldman, E. I.
    Kuharskaya, N. F.
    Levashov, S. A.
    Chucheva, G. V.
    SEMICONDUCTORS, 2019, 53 (01) : 42 - 45
  • [38] Capacitance-voltage characterization of AlN/GaN metal-insulator-semiconductor structures grown on sapphire substrate by metalorganic chemical vapor deposition
    Hashizume, T
    Alekseev, E
    Pavlidis, D
    Boutros, KS
    Redwing, J
    JOURNAL OF APPLIED PHYSICS, 2000, 88 (04) : 1983 - 1986
  • [39] INTERFACE PROPERTIES AND CAPACITANCE-VOLTAGE BEHAVIOR OF INDIUM-PHOSPHIDE METAL-INSULATOR-SEMICONDUCTOR PREPARED BY PLASMA-ASSISTED OXIDATION
    LIM, H
    BAGLIO, JA
    DECOLA, N
    PARK, HL
    LEE, JI
    KANG, KN
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (11) : 7918 - 7920
  • [40] Temperature dependent junction capacitance-voltage characteristics of Ni embedded TiN/SiO2/p-Si metal-insulator-semiconductor structure
    Panda, J.
    Chattopadhyay, S.
    Nath, T. K.
    JOURNAL OF APPLIED PHYSICS, 2013, 114 (22)