Local structure analysis of an optically active center in Er-doped ZnO thin film

被引:124
作者
Ishii, M
Komuro, S
Morikawa, T
Aoyagi, Y
机构
[1] JASRI, Mikaduki, Hyogo 6795198, Japan
[2] Toyo Univ, Fac Engn, Kawagoe, Saitama 3508585, Japan
[3] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
关键词
D O I
10.1063/1.1355284
中图分类号
O59 [应用物理学];
学科分类号
摘要
The local structure of an optically active center in erbium-doped zinc oxide (ZnO:Er) thin film produced by a laser ablation technique and its optical activation process are investigated by Er LIII-edge x-ray absorption fine structure analysis using a synchrotron radiation as an x-ray source. In as-ablated ZnO:Er thin film, Er has an approximately five-fold coordination of O surrounded by eight other O atoms as second-nearest neighbors. The high-order coordination of O decreases the Er-related photoluminescence (PL) intensity due to an undesirable crystal field for 4f radiation transition. After annealing in O-2 ambient, the local structure of Er changes to a pseudo-octahedral structure with C-4v symmetry, similar to the optically activated Er-doped Si (Si:Er), resulting in strong PL. The bond lengths of Er-O are evaluated, and differences in the optical activation processes between ZnO:Er and Si:Er thin films are discussed. (C) 2001 American Institute of Physics.
引用
收藏
页码:3679 / 3684
页数:6
相关论文
共 40 条
  • [1] LOCAL-STRUCTURE OF 1.54-MU-M-LUMINESCENCE ER-3+ IMPLANTED IN SI
    ADLER, DL
    JACOBSON, DC
    EAGLESHAM, DJ
    MARCUS, MA
    BENTON, JL
    POATE, JM
    CITRIN, PH
    [J]. APPLIED PHYSICS LETTERS, 1992, 61 (18) : 2181 - 2183
  • [2] Evidence of energy coupling between Si nanocrystals and Er3+ in ion-implanted silica thin films
    Chryssou, CE
    Kenyon, AJ
    Iwayama, TS
    Pitt, CW
    Hole, DE
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (14) : 2011 - 2013
  • [3] TEMPERATURE-DEPENDENCE AND QUENCHING PROCESSES OF THE INTRA-4F LUMINESCENCE OF ER IN CRYSTALLINE SI
    COFFA, S
    FRANZO, G
    PRIOLO, F
    POLMAN, A
    SERNA, R
    [J]. PHYSICAL REVIEW B, 1994, 49 (23): : 16313 - 16320
  • [4] Direct evidence of impact excitation and spatial profiling of excited Er in light emitting Si diodes
    Coffa, S
    Franzo, G
    Priolo, F
    Pacelli, A
    Lacaita, A
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (01) : 93 - 95
  • [5] 1.54 mu m photoluminescence of Er3+ doped into SiO2 films containing Si nanocrystals: Evidence for energy transfer from Si nanocrystals to Er3+
    Fujii, M
    Yoshida, M
    Kanzawa, Y
    Hayashi, S
    Yamamoto, K
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (09) : 1198 - 1200
  • [8] Luminescence properties of ErO-codoped III-V semiconductors grown by organometallic vapor phase epitaxy
    Fujiwara, Y
    Kawamoto, T
    Koide, T
    Takeda, Y
    [J]. PHYSICA B-CONDENSED MATTER, 1999, 273-4 : 770 - 773
  • [9] XANES analysis of optical activation process of Er in Si:Er2O3 thin film:: Electronic and structural modifications around Er
    Ishii, M
    Komuro, S
    Morikawa, T
    Aoyagi, Y
    Ishikawa, T
    Ueki, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 : 191 - 194
  • [10] Site-selective x-ray absorption fine structure analysis of an optically active center in Er-doped semiconductor thin film using x-ray-excited optical luminescence
    Ishii, M
    Tanaka, Y
    Ishikawa, T
    Komuro, S
    Morikawa, T
    Aoyagi, Y
    [J]. APPLIED PHYSICS LETTERS, 2001, 78 (02) : 183 - 185