Analysis of Super-Steep Subthreshold Slope Body-Tied SOI MOSFET and its Possibility for Ultralow Voltage Application

被引:0
作者
Mori, Takayuki [1 ]
Ida, Jiro [1 ]
机构
[1] Kanazawa Inst Technol, Div Elect Engn, Nonoichi, Ishikawa 9218501, Japan
来源
IEICE TRANSACTIONS ON ELECTRONICS | 2018年 / E101C卷 / 11期
关键词
body-tied; floating-body; SOI; steep subthreshold slope; ultralow power; TRANSISTORS; SNAPBACK; LATCH; MODEL;
D O I
10.1587/transele.E101.C.916
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we review a super-steep subthreshold slope (SS) (< 1 mV/dec) body-tied (BT) silicon on insulator (SOI) metal oxide semiconductor field effect transistor (MOSFET) fabricated with 0.15 mu m SOI technology and discuss the possibility of its use in ultralow voltage applications. The mechanism of the super-steep SS in the BT SOI MOSFET was investigated with technology computer-aided design simulation. The gate length/width and Si thickness optimizations promise further reductions in operation voltage, as well as improvement of the ION/IOFF ratio. In addition, we demonstrated control of the threshold voltage and hysteresis characteristics using the substrate and body bias in the BT SOI MOSFET.
引用
收藏
页码:916 / 922
页数:7
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