Micromagnetic simulation of magnetization reversal process and stray field behavior in Fe thin film wire

被引:2
|
作者
Ohno, Munekazu [1 ]
Yoh, Kanji [1 ,2 ]
机构
[1] Hokkaido Univ, Res Ctr Integrated Quantum Elect, Sapporo, Hokkaido 0608628, Japan
[2] JST, CREST, Kawaguchi, Saitama 3320022, Japan
关键词
D O I
10.1063/1.2821731
中图分类号
O59 [应用物理学];
学科分类号
摘要
The magnetization reversal process of Fe thin film wire is studied based on two-dimensional micromagnetic simulation. It is demonstrated that the external field parallel to the width direction results in the formation of a 180 degrees Neel wall, whereas the field applied to the thickness direction yields the Bloch-like walls, which turn into C-type walls in the residual state. These behaviors are explained by the anisotropic dependence of wall energy in the direction of the external field. The stray field during this process is analyzed in detail.
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页数:9
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