Escape length of ultraviolet induced photoelectrons in alkali iodide and CsBr evaporated films: Measurements and modeling

被引：25

作者：

Boutboul, T ^{[1
]}

Akkerman, A ^{[1
]}

Breskin, A ^{[1
]}

Chechik, N ^{[1
]}

机构：

[1] Weizmann Inst Sci, Dept Particle Phys, IL-76100 Rehovot, Israel

来源：

JOURNAL OF APPLIED PHYSICS | 1998年 / 84卷 / 05期

关键词：

D O I：

10.1063/1.368395

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The escape length of electrons photoinduced from thin CsI, KI, RbI, NaI, and CsBr evaporated films was measured in the 140-180 nm photon spectral range. Theoretical model predictions of the escape length value are in fair agreement with the experimental results. They wary between 10 and 40 nm, the highest values being for CsI, RbI and CsBr. For CsI, measured and calculated ultraviolet-induced escape length values are consistent with that determined from x-ray photoemission quantum yield data. Post-evaporation annealing: of the films had no major impact on the measured electron transport properties. (C) 1998 American Institute of Physics. [S0021-8979(98)02717-0].

引用

页码：2890 / 2896

页数：7

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