Calix[4]resorcinarene derivatives as high-resolution resist materials for Supercritical CO2 processing

被引：24

作者：

Felix, Nelson M. ^{[2
]}

De Silva, Anuja ^{[3
]}

Ober, Christopher K. ^{[1
]}

机构：

[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

[2] Cornell Univ, Sch Chem & Biomol Engn, Ithaca, NY 14853 USA

[3] Cornell Univ, Dept Chem & Biol Chem, Ithaca, NY 14853 USA

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 07期

关键词：

D O I：

10.1002/adma.200702772

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Ultra-high-resolution lithography resists based on calix[4]resorcinarene derivatives are shown to be compatible with supercritical CO2 processing upon the incorporation of specific functionalities, as illustrated by the inset to the figure. The compounds show high glass-transition temperatures, excellent solubility in supercritical CO2, and good film forming properties, enabling the patterning of line/space features as small as 70 nm (depicted in the figure).

引用

页码：1303 / +

页数：8

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